Dainippon Screen Mfg. Co., Ltd.

Eiji Okuno

Takeshi Yoshida

Takashi Hara

A substrate processing apparatus includes a cassette placing table; a first transfer mechanism having a first substrate holding hand capable of advancing/retreating and using this first substrate holding hand to transfer a substrate with respect to the cassette; a substrate processing unit for executing a predetermined process on a substrate; a second transfer mechanism having a second substrate holding hand capable of advancing/retreating and pivotable at a vertical axis, and using the second substrate holding hand to transfer a substrate with respect to the first transfer mechanism and the substrate processing unit; a moving mechanism for moving the first transfer mechanism in an arrangement direction of the cassettes; and a control unit for controlling transfer of a substrate between the first transfer mechanism and the second transfer mechanism in a position where the first transfer mechanism is opposed to a cassette.

Substrate processing apparatus and substrate transfer method

A substrate holding device according to the present invention comprises: a motor; a rotating shaft rotated by the driving force of the motor; a spin base coupled to the rotating shaft and rotated integrally with the rotating shaft; a cover member surrounding the motor and having its one end arranged in the vicinity of the spin base; a rotating ring fixed to a surface, opposite to the cover member, of the spin base; a fixed ring arranged opposite to the rotating ring along the axis of the rotating shaft; a spring provided at the one end of the cover member for elastically urging the fixed ring toward the rotating ring; and clean gas supply mechanism for supplying clean gas to a space between the rotating ring and the fixed ring. Either one of a surface, opposite to the fixed ring, of the rotating ring and a surface, opposite to the rotating ring, of the fixed ring is formed with a gas introducing recess into which the clean gas is to be introduced by the clean gas supply mechanism, and either one of the opposite surfaces being formed with a dynamic pressure creating recess for creating the dynamic pressure of the gas between the rotating ring and the fixed ring when the rotating ring rotates.

Substrate holding device and substrate processing apparatus

A substrate transport apparatus includes a first substrate transport robot, a second substrate transport robot and a substrate transfer mechanism. The first substrate transport robot includes an upper hand and a lower hand vertically arranged. The second substrate transport robot includes an upper hand and a lower hand vertically arranged. The substrate transfer mechanism includes an upper hand and a lower hand vertically arranged and a hand driving mechanism adapted to perform hand opening and closing operations to vertically move the upper and lower hands.

Substrate transport apparatus and substrate transport method

A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the peripheral edge of the substrate such that the holding members are capable of holding the substrate, and retreat positions at which the holding members are retreated from the holding positions; a holding members drive mechanism for driving the holding members between the holding positions and the retreat positions; and a rotation regulating mechanism arranged to be brought, in association with the operation of the holding-member drive mechanism, into a rotation allowing state where the spin base is allowed to be rotated and into a rotation regulating state where the rotation of the spin base is regulated.

Growing community of inventors

Kyoto, Japan

Eiji Okuno