Applied Chemical Solutions

Lam Research Corporation

Other

Lucid Treatment Systems, Inc.

Linica Group, Ltd.

Edward T Ferri, Jr

J Tobin Geatz

Randall L Green

Gary L Corlett

Wilbur C Krusell

Rahul Jairath

Anil K Pant

Erik H Engdahl

Glenn A Roberson, Jr

Eugene W Bernosky

A system and method for planarizing a plurality of semiconductor wafers is provided. The method includes the steps of processing each wafer along the same process path using at least two polishing stations to each partially planarize the wafers. The system includes an improved process path exchanging a detachable wafer carrying head with spindles at each processing point and conveying the detached wafer carrying heads in a rotary index table between processing points. The system also provides for improved polishing accuracy using linear polishers having pneumatically adjustable belt tensioning and aligning capabilities.

Method of transporting a semiconductor wafer in a wafer polishing system

Abrasive components and clear fluids are separated from an aqueous chemical mechanical slurry used for planarization of semiconductor materials, to permit the reuse of the clear liquid effluent in non-process applications as well as for gray water for irrigation, process cooling water, or as make-up water for a reverse osmosis system, or safe disposal in the industrial waste stream, as desired. A solids detection device determines the concentration of abrasive solids in the aqueous waste effluent stream, and a diverter valve receives and diverts the entire aqueous waste effluent stream to at least one reuse water collection tank when the abrasive solids concentration is below a desired threshold, and diverts the entire aqueous waste effluent stream to at least one concentrate water collection tank when the abrasive solids concentration is greater than or equal to the threshold. With the additional use of ion exchange, the resulting water stream can be reused in high purity water applications.

Apparatus and process for separation and recovery of liquid and slurry abrasives used for polishing

Method and apparatus for polishing semiconductor wafers

Abrasive components and clear fluids are separated from an aqueous chemical mechanical slurry used for planarization of semiconductor materials, to permit the reuse of the clear liquid effluent in non-process applications as well as for gray water for irrigation, process cooling water, or as make-up water for a reverse osmosis system, or safe disposal in the industrial waste stream, as desired. A solids detection device determines the concentration of abrasive solids in the aqueous waste effluent stream, and a diverter receives and diverts the entire aqueous waste effluent stream to at least one reuse water collection tank when the abrasive solids concentration is below a desired threshold, and diverts the entire aqueous waste effluent stream to at least one concentrate water collection tank when the abrasive solids concentration is greater than or equal to the threshold. With the additional use of ion exchange, the resulting water stream can be reused in high purity water applications.

Apparatus for separation and recovery of liquid and slurry abrasives used for polishing

A closure assembly for a pressure vessel having an opening in the external surface thereof, comprising a concentric guide track secured to the external surface of the pressure vessel, a curved concentric closure or door configured to conform to the curvature of the pressurized tank, means for interlocking the concentric door to the pressure vessel when the door is in the closed position and an inflatable seal that fills the void between the door and the pressurized tank when the door is closed and the seal inflated. The concentric guide track includes upper and lower concentric tracks upon which the concentric door is mounted and capable of moving along the track such that it can be rotated to the back of the pressure vessel when in the opened position and rotated to close and seal the opening within the pressure vessel in the closed position. Door restraining flanges are provided which correspond and interact with the leading and trailing edges of the concentric door in order to interlock the door to the pressure vessel when the door is closed. Once the pressure vessel is pressurized, the concentric door is pressed against the restraining flanges and the forces of pressurization are transferred from the interlocked concentric door to the pressure vessel.

Closure assembly for pressure vessel

A chemical delivery system for the direct delivery of a chemical from a drum to a process area comprising a pressurized tank having a pressure/vacuum lock closure, a drum containing a chemical to be dispensed housed within the pressurized tank, and a closed loop electronic feed back system for the controlled dispensing of the chemical from the drum to a process area without the use of a pumping system. The closed loop electronic feed back system monitors and controls the flow of chemical from the drum by regulating the pressure within the pressurized tank. In an alternative embodiment, a closed loop electro-pneumatic fluid control system is provided which controls or modulates a pneumatic output valve disposed between the drum and the process in order to regulate the chemical flow from the drum. In another alternative embodiment, the chemical dispensing system7 utilizes a combination of the closed loop electronic feed back system and the closed loop electro-pneumatic fluid control system for regulating chemical flow from the drum.

Chemical dispensing system

A chemical mixing system for mixing ingredients at desired concentrations concentration within a qualification range. Batches of the mixed chemical are mixed in a relatively small mix vessel and transferred to a relatively large mix drum. The concentration of the chemical within the mix drum is measured by a concentration monitor. If the measured concentration of the chemical in the mix drum is within the qualification range, the batches of chemical in the mix vessel are mixed to the desired concentration. If the measured concentration of the chemical in the mix drum is below the qualification range, the batches of chemical in the mix vessel are mixed to a high concentration which is greater than the desired concentration. If the measured concentration of the chemical in the mix drum is above the qualification range, the batches of chemical in the mix vessel are mixed to a low concentration which is less than the desired concentration. Batch averaging is thereby performed to maintain the concentration of chemical in the mix drum within the desired qualification range.

Two-stage chemical mixing system

Apparatus for the delivery of a chemical slurry to at least one downstream facility. The apparatus comprises a measuring vessel of predetermined volume into which a liquid chemical component is introduced. A conduit connects the measuring vessel to multiple chemical sources, wherein each of said chemical sources comprises a liquid chemical component. Another conduit connects the measuring vessel to at least one mix tank. A pressure-vacuum vessel is in communication with said at least one mix tank, whereby chemical is drawn from said at least one mix tank to the pressure-vacuum vessel under negative pressure and chemical is delivered from the pressure-vacuum vessel to said at least one downstream facility under positive pressure. The pressure-vacuum vessel is in fluid communication with both said at least one mix tank and said at least one downstream facility. Valves on each of the conduits control the chemical flow therethrough. The chemical slurry is produced in said least at one mix tank by combining chemicals from one or more of the multiple chemical sources, and the slurry is delivered from said at least one mix tank to said at least one downstream facility.

Apparatus and method for mixing chemicals to be used in

A chemical mixing system for mixing ultra pure water and concentrated HF to a desired concentration within a qualification range. Batches of the mixed chemical are mixed in a relatively small mix vessel and transferred to a relatively large mix drum. The concentration of the chemical within the mix drum is measured by a concentration monitor. If the measured concentration of the chemical in the mix drum is within the qualification range, the batches of chemical in the mix vessel are mixed to the desired concentration. If the measured concentration of the chemical in the mix drum is below the qualification range, the batches of chemical in the mix vessel are mixed to a high concentration which is greater than the desired concentration. If the measured concentration of the chemical in the mix drum is above the qualification range, the batches of chemical in the mix vessel are mixed to a low concentration which is less than the desired concentration. Batch averaging is thereby performed to maintain the concentration of chemical in the mix drum within the desired qualification range.

The present invention provides improved method and apparatus for the transfer and delivery of very high purity chemicals for use in semiconductor production and similar processes. By employing a series of vessels arranged in parallel, a vacuum system to draw chemical from one or more bulk sources into the vessels, and a pressure system to deliver chemical under pressure from the vessels, chemicals can be easily delivered from any bulk source to one or more end-users. The use of a vacuum system to draw chemicals through sealed conduits eliminates the need for pumps which are a source of both maintenance problems and contamination in the system. Multiple vessels provide for a variety of flow options, which include continuous and uniform chemical delivery to the end-users, recirculation and regular filtration during periods of low use, and built-in redundancy to avoid system shut down if there is a component failure. Computer controlled process systems provides system flexibility and full automation.

Process and apparatus for electronic control of the transfer and

Apparatus and method for accurate measuring and mixing of chemicals is disclosed. The apparatus includes one or more metered vessels having a container of predetermined volume and at least one constricted vent tube therein. By mounting a sensor on the constricted vent tube, a greatly amplified measurement of the precise chemical volume in the metered vessel is provided. The apparatus and method of the present invention readily lends itself to a variety of applications and can be adapted to handle virtually any form of chemical mixing, diluting, or generating process.

Growing community of inventors

Gilroy, CA, United States of America

Edward T Ferri, Jr