Qualcomm Incorporated

Durodami Lisk

Hong Bok We

Aniket Patil

Yue Li

Charles David Paynter

Darko Popovic

A device comprising a first package and a second package coupled to the first package through a first plurality of solder interconnects. The first package includes a first substrate comprising at least one first dielectric layer and a first plurality of interconnects, and a first integrated device coupled to the first substrate. The second package includes a second substrate comprising at least one second dielectric layer and a second plurality of interconnects, a second integrated device coupled to a first surface of the second substrate, a third integrated device coupled to the first surface of the second substrate through a second plurality of solder interconnects and a first plurality of channel interconnects coupled to the first surface of the second substrate, wherein the first plurality of channel interconnects is located between solder interconnects from the second plurality of solder interconnects.

Package comprising channel interconnects located between solder interconnects

Multiple (multi-) die integrated circuit (IC) packages for supporting higher connection density, and related fabrication methods. The multi-die IC package includes split dies that provided in respective die packages that are stacked on top of each other to conserve package area. To support signal routing, including through-package signal routing that extends through the die package, each die package includes vertical interconnects disposed adjacent to their respective dies and coupled to a respective package substrate (and interposer substrate if provided) in the package substrate. In this manner, as an example, through-silicon-vias (TSVs) are not required to be fabricated in the multi-die IC package that extend through the dies themselves to provide signal routing between the respective die packages. In another example, space created between adjacent interposer substrates of stacked die packages, as stood off from each other through the interconnect bumps, provides an area for heat dissipation.

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San Diego, CA, United States of America

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