Tokyo Electron Limited

Therma-wave, Inc.

Douglas E Ruth

Clinton Carlisle

Fred E Stanke

Edric Tong

Elliot Burke

James M Cahill

Hung The Pham

Michael Weber

Adam Eales Norton

Michael Weber-Grabau

Hung V Pham

This invention is an apparatus for imaging metrology, which in particular embodiments may be integrated with a processor station such that a metrology station is apart from but coupled to a process station. The metrology station is provided with a first imaging camera with a first field of view containing the measurement region. Alternate embodiments include a second imaging camera with a second field of view. Preferred embodiments comprise a broadband ultraviolet light source, although other embodiments may have a visible or near infrared light source of broad or narrow optical bandwidth. Embodiments including a broad bandwidth source typically include a spectrograph, or an imaging spectrograph. Particular embodiments may include curved, reflective optics or a measurement region wetted by a liquid. In a typical embodiment, the metrology station and the measurement region are configured to have 4 degrees of freedom of movement relative to each other.

Apparatus for imaging metrology

Wafer metrology apparatus and method

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Sunnyvale, CA, United States of America

Douglas E Ruth