Kla Tencor Corporation

Bruker Technologies Ltd.

Dor Perry

Andrew V Hill

Yuri Paskover

Ohad Bachar

Matthew Wormington

Alexander Krokhmal

Avi Abramov

Asher Peled

Alexander Brandt

A system includes first and second imaging assemblies, and a processor. The first imaging assembly is configured to produce a first image of a measurement site in a sample. The second imaging assembly is coupled with a measurement assembly and is configured to produce a second image of the measurement site. The processor is configured to: (i) perform, based on the first image, a first movement of the sample relative to the measurement assembly, (ii) perform, based on the second image, a second movement of the sample for aligning the sample with the measurement assembly, and (iii) control the measurement assembly to perform a measurement in the measurement site.

Navigation accuracy using camera coupled with detector assembly

An overlay metrology tool providing site-by-site alignment includes a controller coupled to a telecentric imaging system. The controller may receive two or more alignment images of an overlay target on a sample captured at two or more focal positions by the imaging system, generate alignment data indicative of an alignment of the overlay target within the imaging system based on the alignment images, set the alignment images as measurement images when the alignment of the overlay target is within selected alignment tolerances, direct the imaging system to adjust the alignment of the overlay target in the imaging system and further receive one or more measurement images from the imaging system when the alignment of the overlay target is outside the selected alignment tolerances, and determine overlay between two or more layers of the sample based on at least one of the measurement images.

Localized telecentricity and focus optimization for overlay metrology

Growing community of inventors

Haifa, Israel

Dor Perry