Samsung Electronics Co., Ltd.

Dongkyeng Han

Junghwan Kim

Ohkug Kwon

Sanghun Kim

Sunghyup Kim

Injae Lee

Jeonggil Kim

Jinwook Jung

HoSun Yoo

Tae-hyun Han

Youngduk Suh

Yongchan Kim

Ouiserg Kim

Daerim Choi

Sangbeom Park

Kukbin Choi

A semiconductor fabrication apparatus comprising a light source configured to emit light, a substrate stage arranged to receive a substrate exposed to the emitted light, a reticle arranged between the substrate stage and the light source, and a reticle stage arranged to receive the reticle. The reticle stage including a lower plate, an upper plate arranged above the lower plate, an actuator connected to the lower plate configured to move in a direction parallel to the upper plate, a first cable slab arranged between the upper plate and the lower plate and connected to one side of the actuator, and a first cable cover that surrounds an outer periphery of the first cable slab and contacts the lower plate when the first cable slab becomes bent.

Semiconductor fabrication apparatus

An extreme ultraviolet (EUV) light generating apparatus includes a vessel including a first end and a second end opposite to each other and providing an internal space extending from the first end to the second end, a concave mirror adjacent to the first end of the vessel, a droplet generator supplying a droplet to the internal space of the vessel, a laser light source irradiating a laser beam to cause the droplet to emit EUV light, and a gas jet receiving a flow control gas and spraying the received flow control gas into the internal space of the vessel. The gas jet includes a ring-shaped main body including nozzles spaced apart from one another in a circumferential direction. The nozzles spray the received flow control gas in a downward direction.

Apparatus for generating extreme ultraviolet light and lithography apparatus including the same

Growing community of inventors

Suwon-si, South Korea

Dongkyeng Han