Lam Research Corporation

General Electric Company

Dmitry Opaits

Jorge Luque

Andrew D Bailey, Iii

Daniel Jason Erno

Eric A Pape

Seyed Gholamali Saddoughi

Fulton Jose Lopez

Stephen Bertram Johnson

Robert Michael Zirin

Peggy Lynn Baehmann

Anurag Gupta

Matthew Patrick Boespflug

Siyuan Tian

Marcus Musselman

Grover Andrew Bennett

Seonkyung Lee

Benny Wu

Jeffrey D Bonde

Various embodiments include a reflectometer and a reflectometry system for monitoring movements of a substrate, such as a silicon wafer. In one embodiment, a reflectometry system monitors and controls conditions associated with a substrate disposed within a process chamber. The process chamber includes a substrate-holding device having an actuator mechanism to control movement of the substrate with respect to the substrate-holding device. The reflectometry system includes a light source configured to emit a beam of light directed at the substrate, collection optics configured to receive light reflected from the substrate by the beam of light directed at the substrate and output a signal related to one or more conditions associated with the substrate, and a processor configured to process the signal and direct the actuator mechanism to control the movement of the substrate with respect to the substrate-holding device based on the signal. Other devices and methods are disclosed.

Reflectometer to monitor substrate movement

A substrate support in a substrate processing system includes an inner portion arranged to support a substrate, an edge ring surrounding the inner portion, and a controller. The controller, to selectively cause the edge ring to engage the substrate and tilt the substrate, controls at least one actuator to at least one of raise and lower the edge ring and raise and lower the inner portion of the substrate support. The controller determines an alignment of a measurement device in the substrate processing system based on a signal reflected from a surface of the substrate when the substrate is tilted.

Systems and methods for aligning measurement device in substrate processing systems

A partial unclamping detection system is provided and includes a light emission circuit, a spectrometer, and a system controller. The light emission circuit is configured to emit light at an area of a substrate while the substrate is electrostatically clamped to an electrostatic chuck of a substrate processing system. The spectrometer is configured to detect light reflected off the substrate and generate a first output signal based on the detected light. The system controller is configured to: detect changes in the first output signal; detect changes in a flow rate of a gas supplied to a backside of the substrate; and based on both the changes in the first output signal and the changes in the flow rate, determine whether a partial unclamping event of the substrate has occurred.

Detecting partial unclamping of a substrate from an ESC of a substrate processing system

A deployable aerodynamic component configured to be mounted to a wind turbine. The wind turbine includes at least one rotor blade. The deployable aerodynamic component configured to be positioned in front of an inner portion of the at least one rotor blade, and is structurally configured to cover a substantial portion of the inner portion of the at least one rotor blade in a wind direction during deployment of the deployable aerodynamic component and to allow the passage therethrough of an incoming wind when non-deployed. Further described is a wind turbine including the above-described deployable aerodynamic component and method for aerodynamic performance enhancement of an existing wind turbine, wherein the method includes mounting the above-described deployable aerodynamic component to a wind turbine.

Apparatus and method for aerodynamic performance enhancement of a wind turbine

A spectral reflectometer system for measuring a substrate is provided. A light source is provided. At least one optical detector is provided. An optical cable comprises a plurality of optical fibers, wherein the plurality of optical fibers comprises a first plurality of optical fibers, which are transmission optical fibers which extend from the light source to an optical path, and a second plurality of optical fibers, which are reflection optical fibers which extend from the optical path to the at least one optical detector. A microlens array is in the optical path.

Apparatus with a spectral reflectometer for processing substrates

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Fremont, CA, United States of America

Dmitry Opaits