Carl-zeiss-smt Ag

Dirk Rothweiler

Jörg Schultz

Wolfgang Singer

Martin Antoni

Nils Dieckmann

There is provided an illumination system. The illumination system includes a first light source and a second light source, each of which are for providing light having a wavelength &#x2266;193 nm, and an optical element. The first light source illuminates a first area of the optical element and the second light source illuminates a second area of the optical element.

EUV illumination system having a plurality of light sources for illuminating an optical element

There is provided an illumination system for EUV-wavelengths. The illumination system includes a plurality of EUV-light sources and an optical unit combining the plurality of EUV-light sources.

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Bangkok, Thailand

Dirk Rothweiler