Carl Zeiss Smt Gmbh

Carl Zeiss Sms Ltd.

Dietmar Neugebauer

Albrecht Hof

Rolf Freimann

Armin Bich

Matthias Manger

Bernd Doerband

Stefan Schulte

Bernd Dörband

Frank Riepenhausen

Günter Maul

Monika Frey

Wolfgang Scherm

Stefan Otto

Rainer Maul

Helmut Issler

Helmut Krause

An optical system, such as a microlithographic projection exposure apparatus, includes a first optical component, a second optical component, and a measurement arrangement for determining the relative position of the first optical component and the second optical component in six degrees of freedom. The measurement arrangement is adapted to determine the relative position of the first optical component and the second optical component over six different length measurement sections. The length measurement sections extend directly between the first optical component and the second optical component.

Optical system, in particular in a microlithographic projection exposure apparatus

Measuring a shape of an optical surface () of a test object () includes: providing an interferometric measuring device () generating a measurement wave (); arranging the measuring device () and the test object () consecutively at different measurement positions relative to each other, such that different regions () of the optical surface () are illuminated by the measurement wave (); measuring positional coordinates of the measuring device () at the different measurement positions in relation to the test object (); obtaining surface region measurements by interferometrically measuring the wavefront of the measurement wave () after interaction with the respective region () of the optical surface () using the measuring device () in each of the measurement positions; and determining the actual shape of the optical surface () by computationally combining the surface region measurements based on the measured positional coordinates of the measuring device () at each of the measurement positions.

Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring device

A device for measuring lithography masks is provided, comprising

Device and method for measuring lithography masks

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Aalen, Germany

Dietmar Neugebauer