Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Dieter Bader

Wilhelm Ulrich

Wolfgang Singer

Alexander Epple

Aurelian Dodoc

David R Shafer

Martin Endres

Bernd Kleemann

Joachim Hainz

Ole Fluegge

Alexander Ostendorf

Method and device for producing an adhesive bond between a first component and a second component (optical element) for microlithography. The method involves: introducing the first and second components into a positioning device for changing the relative position between the first and second components, calibrating a first relative position, in which a distance between the first and second components has a first value defining a predefined adhesive gap, calibrating a second relative position, in which a distance between the first and second components has a second value greater than the first value, applying adhesive to the first component while the first and second components are at a distance greater than the first value, and setting the first relative position while forming the adhesive bond between the first and second components. Calibrating the first and second relative positions are carried out before the adhesive is applied to the first component.

Method and device for producing an adhesive bond between a first component and a second component

A sealing device seals a first component part of a lithography apparatus vis-&#xe0;-vis a multiplicity of second component parts of the lithography apparatus. The sealing device includes a multiplicity of sealing rings and a multiplicity of connection locations. The sealing rings are connected to one another with the aid of the connection locations.

Sealing device, component and lithography apparatus

An illumination system of a microlithographic projection exposure apparatus includes a light source configured to produce projection light that propagates along a light path. The illumination system also includes a beam deflection array of reflective or transmissive beam deflection elements. Each beam deflection element is configured to deflect an impinging light beam by a deflection angle that is variable in response to a control signal. The beam deflection array is used in a first mode of operation to determine an irradiance distribution in the system pupil surface. The system further includes an optical raster element, in particular a diffractive optical element, which is used in a second mode of operation to determine the irradiance distribution in the system pupil surface. An exchange unit is configured to hold the optical raster element in the second mode of operation such that it is inserted into the light path.

Illumination system of a microlithographic projection exposure apparatus

A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA&#x3e;0.85 and a demagnifying imaging scale where |b|&#x3c;0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.

Projection objective, projection exposure apparatus and reflective reticle for microlithography

A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.

Growing community of inventors

Goeggingen, Germany

Dieter Bader