Stc.unm

Carl Zeiss Smt Gmbh

Carl Zeiss Microscopy Gmbh

Deying Xia

Steven Roy Julien Brueck

Alexander Neumann

Yuliya Kuznetsova

Ulrich Mantz

Shawn McVey

Brett Lewis

Wilhelm Kuehn

An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.

Inspection system and inspection method to qualify semiconductor structures

In accordance with the invention, there is a method of forming a nanochannel including depositing a photosensitive film stack over a substrate and forming a pattern on the film stack using interferometric lithography. The method can further include depositing a plurality of silica nanoparticles to form a structure over the pattern and removing the pattern while retaining the structure formed by the plurality of silica nanoparticles, wherein the structure comprises an enclosed nanochannel.

Fabrication of enclosed nanochannels using silica nanoparticles

In accordance with the invention, there are surfaces exhibiting anisotropic wetting, microfluidic devices and microreactors including the surfaces and methods of controlling anisotropic wetting behavior of the surfaces. The exemplary surface can include a substrate and a plurality of rectangular shaped structures arranged to form a macroscopic pattern over the substrate, wherein the plurality of rectangular shaped structures delineate a top surface of the rectangular structures from a surface of the substrate, the rectangular shaped structures including substantially vertical walls having a height of about 100 nm to about 10 &#x3bc;m and wherein the shape of the macroscopic pattern, the height of the substantially vertical walls, and a surface chemistry of the top surface controls anisotropic wetting at the top surface of the rectangular structures.

Anisotropic wetting behavior on one-dimensional patterned surfaces for applications to microfluidic devices

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Belmont, MA, United States of America

Deying Xia