Leica Microsystems Jena Gmbh

Vistec Semiconductor Systems Jena Gmbh

Detlef Wolter

Matthias Slodowski

Joachim Wienecke

Kuno Backhaus

Horst-Dieter Jaritz

The invention concerns an optical measurement arrangement, in particular for the examination of layer systems, and can include an illumination device having at least one illumination source for delivering a measurement light beam and coupling the measurement light beam into the beam path of a layer thickness measuring instrument. In such a measurement arrangement, the illumination device can be housed in a lamp housing that may be detachably connected to the remaining portion of the measurement arrangement via an installation element wherein illumination sources can be prealigned with respect to the beam path.

Measurement system with an optical measurement arrangement

In a method for monitoring the measurement light emitted from an illumination apparatus for an optical measuring instrument, a continuous sensing of measurement light parameters is performed. The sensed measurement light parameters are compared to predefined setpoints. Any deviation from the predefined parameter ranges associated with the setpoints is signaled. This signal is used to initiate a lamp exchange on the illumination apparatus, which has multiple lamps that can be selectively switched on and off individually or in groups. Also described is a corresponding illumination apparatus that preferably performs a lamp exchange automatically. The result is to identify a point in time for a lamp change that is optimal with regard to measurement accuracy and the longest possible utilization of the lamps, so that a measurement light quality that remains consistent during continuous operation can reliably be maintained within predefined tolerance ranges.

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Jenapriessnitz, Germany

Detlef Wolter