Kla Tencor Corporation

Dragerwerk Aktiengesellschaft

Detlef Wolter

Ulrich Pohlmann

Ralf Drews

Joseph Walsh

Francis Chilese

Hansjochen Schuck

Uwe Schaller

Joseph Fleming Walsh

Francis Charles Chilese

Systems and methods to control particle generation in a reticle inspection system are presented. The number of particles added to a reticle during an entire load-inspect-unload sequence of a reticle inspection system is reduced by performing all reticle contact events in a controlled, flowing air environment. In one embodiment, the reticle is fixed to a carrier by clamping outside of the vacuum environment, and the carrier, rather than the reticle, is coupled to the reticle stage of the inspection system. In this manner, the high levels of back-side particulation associated with electrostatic chucking are avoided. In addition, the carrier is configured to be coupled to the reticle stage in any of four different orientations separated by ninety degrees.

Apparatus and methods for reticle handling in an EUV reticle inspection tool

A breathing apparatus with a display unit for the transmission of measured data via a display field of the display unit into the field of vision of a person wearing the unit. The readability of the measured data displayed is improved in daylight with simultaneously reduced energy demand. The display field includes an LC display, which is at least transparent for transmission radiation. An optical concentrator is provided, which collects the ambient light via a light entering surface and emits the collected light via a light exiting surface.

Breathing apparatus with a display unit

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Jena, Germany

Detlef Wolter