Industrial Technology Research Institute

Accent Optical Technologies, Inc.

Deh Ming Shyu

Yi Sha Ku

Wei Te Hsu

Hsiu Lan Pang

Nigel Peter Smith

Chun Hung Ko

Shih Chun Wang

A method for designing a two-dimensional array overlay target comprises the steps of: selecting a plurality of two dimensional array overlay targets having different overlay errors; calculating a deviation of a simulated diffraction spectrum for each two-dimensional array overlay target; selecting an error-independent overlay target by taking the deviations of the simulated diffraction spectra into consideration; and designing a two dimensional array overlay target based on structural parameters of the error-independent overlay target.

Method for designing two-dimensional array overlay targets and method and system for measuring overlay errors using the same

A method for designing a two-dimensional array overlay target set comprises the steps of: selecting a plurality of two-dimensional array overlay target sets having different overlay errors; calculating a deviation of a simulated diffraction spectra for each two-dimensional array overlay target set; selecting a sensitive overlay target set by taking the deviations of the simulated diffraction spectra into consideration; and designing a two-dimensional array overlay target set based on the structural parameters of the sensitive overlay target set.

Method for designing two-dimensional array overlay target sets and method and system for measuring overlay errors using the same

A system for via structure measurement is disclosed. The system comprises a reflectometer, a simulation unit and a comparing unit. The reflectometer is configured to collect a measured diffraction spectrum of at least a via. The simulation unit is configured to provide simulated diffraction spectrums of the at least a via. The comparing unit is configured to determine at least a depth and at least a bottom profile of the at least a via by comparing the collected diffraction spectrum and the simulated diffraction spectrums.

System and method for via structure measurement

A method for designing a grating comprises steps of (a1) generating a first diffraction spectrum based on calculation values of a plurality of structural parameters, (a2) calculating a first difference value between the first diffraction spectrum and a first nominal spectrum, (a3) setting a default difference value with the first difference value and default structural parameter values with the structural parameter values, (b1) changing one of the structural parameter values to generate a second diffraction spectrum, (b2) calculating a second difference value between the second diffraction spectrum and a second nominal spectrum, and (c) comparing the default difference value and the second difference value, updating a default difference value with the smaller one, and updating the default structural parameter values with the structural parameter values corresponding to the smaller one.

Method for designing gratings

A method for correlating line width roughness of gratings first performs a step (a) generating a characteristic curve of a predetermined grating having a known line width, and a step (b) performing a comparing process to select a matching spectrum from a plurality of simulated diffraction spectrum of known line width, and setting the known line width of the matching spectrum as the virtual line width of the predetermined grating. Subsequently, the method performs a step (c) changing a measuring angle and repeating the steps (a) and (b) to generate a virtual line width curve, and calculating the deviation of the virtual line width curve. The method then performs a step (d) changing the line width roughness of the predetermined grating and repeating the steps (a), (b) and (c), and a step (e) correlating the line width roughness and the deviation of the virtual line width curve to generate a correlating curve.

Method for correlating the line width roughness of gratings and method for measurement

A method for inspecting a grating biochip comprises the steps of irradiating a grating biochip using a light beam, measuring a diffracted light using a photodetector, selecting a plurality of parameters of the grating biochip, and optimizing the parameters to enhance the detection sensitivity, wherein the diffracted light is generated by the light beam passing the grating biochip. The grating biochip comprises a grating structure including a semiconductor substrate, a grating positioned on the semiconductor substrate and a dielectric layer covering the grating and the semiconductor substrate. The sample of the biochip is positioned on the grating structure.

Growing community of inventors

Jhunan, Taiwan

Deh Ming Shyu