Media Lario S.r.l.

Dean Shough

Daniel G Stearns

Boris Grek

Natale Ceglio

Fabio E Zocchi

Robert David Banham

Giuseppe Valsecchi

Richard Levesque

Gordon Yue

Giovanni Bianucci

Marco Pedrali

Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.

Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography

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Newark, CA, United States of America

Dean Shough