Lam Research Corporation

David W Mytton

Gladys So-Wan Lo

Gregory James Goldspring

Greg Goldspring

Disclosed is an inventive method for etching a gold metallization in a plasma processing chamber. The method includes introducing a substrate having a gold layer and an overlying titanium hardmask layer into the plasma processing chamber. The hardmask is first etched using conventional etching techniques. Then a plasma is formed in the chamber from an oxidizing gas and an etching gas. The etching gas is preferably a hydrochloric acid containing gas which may contain a chlorine containing gas. In addition, N may be provided. The plasma is then used to etch the gold layer through the titanium hardmask.

Method and apparatus for etching a gold metal layer using a titanium hardmask

Disclosed is an inventive method for etching a gold metallization in a plasma processing chamber. The method includes introducing a substrate having a gold layer and an overlying titanium hardmask layer into the plasma processing chamber. The hardmask is first etched using conventional etching techniques. Then a plasma is formed in the chamber from an oxidizing gas and an etching gas. The etching gas is preferably a hydrochloric acid containing gas which may contain a chlorine containing gas. In addition, N,may be provided. The plasma is then used to etch the gold layer through the TiN or TiW hardmask.

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Palo Alto, CA, United States of America

David W Mytton