Axcelis Technologies, Inc.

David Tao

Douglas A Brown

Mathias Koch

Ali Shajii

Hossein Zarrin

Yongzhang Huang

Patrick Richard Splinter

Robert David Meadows

John Zheng Ye

Que Weiguo

The present invention is directed to a switch circuit and method to quickly enable or disable the ion beam to a wafer within an ion implantation system. The beam control technique may be applied to wafer doping repaint and duty factor reduction. The circuit and method may be used to quench an arc that may form between high voltage electrodes associated with an ion source to shorten the duration of the arc and mitigate non-uniform ion implantations. The circuit and method facilitates repainting the ion beam over areas where an arc was detected to recover dose loss during such arcing. A high voltage high speed switching circuit is added between each high voltage supply and its respective electrode to quickly extinguish the arc to minimize disruption of the ion beam. The high voltage switch is controlled by a trigger circuit which detects voltage or current changes to each electrode. Protection circuits for the HV switch absorb energy from reactive components and clamp any overvoltages.

System and method of ion beam control in response to a beam glitch

The present invention is directed to a semiconductor thermal processing system and an apparatus for thermally cooling a semiconductor substrate. According to one aspect of the present invention, a semiconductor thermal processing system and associated apparatus and method are disclosed which provides a segmented cold plate situated within a process chamber, wherein a plurality of segments of the cold plate are operable to radially translate between an engaged position and a disengaged position, wherein a substrate holder may pass between the plurality of segments when the segments are in the disengaged position. According to another aspect, an elevator is operable to linearly translate a substrate residing on a substrate holder between a heating position proximate to a heater assembly and a cooling position proximate to the segmented cold plate. According to another aspect, the cold plate comprises a plurality of holes through which one or more gases may flow, wherein an amount or mixture of the one or more gases is controllable via a controller, and wherein one or more temperature sensors are operable to provide temperature feedback at the substrate. According to another aspect the substrate resides within close proximity to the cold plate, wherein when gas is flowed through the holes, the substrate is cooled in the viscous regime, and the amount and/or mixture of gases flowed through the holes is controlled, based, at least in part, on the one or more measured temperatures.

Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling

The present invention is directed to a pyrometer system and comprises an elevator tube. The elevator tube comprises an inner tube and an outer tube surrounding the inner tube in telescoping arrangement and extending from a top to a bottom thereof, the arrangement defining a fluid passageway therebetween. The elevator tube further comprises a port associated with the outer tube that is operable to transmit a cooling gas therethrough into the fluid passageway. A pyrometer head is coupled to the bottom of the inner tube and is operable to transmit and receive radiation through the inner tube. The system further comprises a spider collar coupled to at least one of a top of the inner tube or outer tube, and is operable to support a work piece for thermal measurement thereof.

Optical path improvement, focus length change compensation, and stray light reduction for temperature measurement system of RTP tool

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Saugus, MA, United States of America

David Tao