Adeia Semiconductor Bonding Technologies Inc.

Adeia Semiconductor Inc.

David Edward Fisch

Javier A DeLaCruz

William C Plants

Steven L Teig

Kent Stalnaker

Shaowu Huang

Curtis Dicke

George Courville

Randall Sandusky

Michael C Parris

Belgacem Haba

Liang Wang

Kenneth Duong

Xu Chang

Pearl Po-Yee Cheng

Direct-bonded native interconnects and active base dies are provided. In a microelectronic architecture, active dies or chiplets connect to an active base die via their core-level conductors. These native interconnects provide short data paths, which forgo the overhead of standard interfaces. The system saves redistribution routing as the native interconnects couple in place. The base die may contain custom logic, allowing the attached dies to provide stock functions. The architecture can connect diverse interconnect types and chiplets from various process nodes, operating at different voltages. The base die may have state elements for drive. Functional blocks aboard the base die receive native signals from diverse chiplets, and communicate with all attached chiplets. The chiplets may share processing and memory resources of the base die. Routing blockages are minimal, improving signal quality and timing. The system can operate at dual or quad data rates. The architecture facilitates ASIC, ASSP, and FPGA ICs and neural networks, reducing footprint and power requirements.

Direct-bonded native interconnects and active base die

A microelectronic unit may include an epitaxial silicon layer having a source and a drain, a buried oxide layer beneath the epitaxial silicon layer, an ohmic contact extending through the buried oxide layer, a dielectric layer beneath the buried oxide layer, and a conductive element extending through the dielectric layer. The source and the drain may be doped portions of the epitaxial silicon layer. The ohmic contact may be coupled to a lower surface of one of the source or the drain. The conductive element may be coupled to a lower surface of the ohmic contact. A portion of the conductive element may be exposed at the second dielectric surface of the dielectric layer. The second dielectric surface may be directly bonded to an external component to form a microelectronic assembly.

Transistor level interconnection methodologies utilizing 3D interconnects

The present disclosure provides for a stacked memory combining RAM and one or more layers of NVM, such as NAND. For example, a first layer of RAM, such as DRAM, is coupled to multiple consecutive layers of NAND using direct bonding interconnect (DBI®). Serialization and overhead that exists in periphery of the NVM may be stripped to manage the data stored therein. The resulting connections between the RAM and the NVM are high bandwidth, high pincount interconnects. Interconnects between each of the one or more layers of NVM are also very dense.

Non-volatile dynamic random access memory

Some embodiments provide a three-dimensional (3D) circuit that has data lines of one or more memory circuits on a different IC die than the IC die(s) on which the memory blocks of the memory circuit(s) are defined. In some embodiments, the 3D circuit includes a first IC die with a first set of two or more memory blocks that have a first set of data lines. The 3D circuit also includes a second IC die that is stacked with the first IC dies and that includes a second set of two or more memory blocks with a second set of data lines. The 3D circuit further includes a third IC die that is stacked with the first and second IC dies and that includes a third set of data lines, which connect through several z-axis connections with the first and second sets of data lines to carry data to and from the first and second memory block sets when data is being written to and read from the first and second memory block sets. The z-axis connections in some embodiments electrically connect circuit nodes in overlapping portions of the first and third IC dies, and overlapping portions of second and third IC dies, in order to carry data between the third set of data lines on the third IC die and the first and second set of data lines of the first and second of memory block sets on the first and second IC dies. These z-axis connections between the dies are very short as the dies are very thin. For instance, in some embodiments, the z-axis connections are less than 10 or 20 microns. The z-axis connections are through silicon vias (TSVs) in some embodiments.

3D memory circuit

A module for multiple dies is disclosed. The module can include a group of dies that include a first die having a first voltage block and a second die having a second voltage block. The module can also include an interconnect that electrically connects the first and second dies. Power supply generation in the first die is enabled in non-active mode, while power supply generation in the second die is disabled. The power supply generation in the second die may be enabled when the second die is in active mode. The first die can send enabling signal to the second the die to enable the second die. The first die can provide supply to the second die in the non-active mode. The first die can send self-refresh timing command to the second die when the module is in a self-refresh mode.

Multi-die module with low power operation

A microelectronic circuit structure comprises a stack of bonded layers comprising a bottom layer and at least one upper layer. At least one of the upper layers comprises an oxide layer having a back surface and a front surface closer to the bottom layer than the back surface, and a plurality of FD-SOI transistors built on the front surface. At least a first back gate line and a second back gate line extend separate from each other above the back surface for independently providing a first back gate bias to a first group of transistors and a second back gate bias to a second different group of transistors.

Back biasing of FD-SOI circuit blocks

This disclosure pertains to hardware compute arrays (sometimes called systolic arrays) for applications such as artificial intelligence (AI), machine learning (ML), digital signal processing (DSP), graphics processing units (GPUs), and other computationally intensive applications. More particularly, it pertains to novel and advantageous architecture innovations for efficiently and inexpensively implementing such arrays using multiple integrated circuits. Hardware and methods are disclosed to allow compute arrays to be tested after face-to-face or wafer-to-wafer bonding and without out any pre-bonding test. Defects discovered in the post-bonding testing can be completely or partially healed increasing yields and reducing costs.

Self healing compute array

The invention pertains to mitigation of row hammer attacks in DRAM integrated circuits. Apparatus and methods are disclosed for an embedded target row refresh (TRR) solution with modest overhead. In operation it is nearly transparent to the user. Except for enablement via the mode register and an increase in the average refresh rate on the order of half of one percent, no further user action is required. The stream of row addresses accompanying ACTIVE commands is monitored and filtered to only track addresses that occur at a dangerous rate and reject addresses that occur at less than a dangerous rate.

DRAM adjacent row disturb mitigation

System and method for providing precision a self calibrating resistance circuit is described that provides for matching a reference resistor using dynamically configurable resistance networks. The resistor network is coupled to the connection, wherein the resistor network provides a configurable resistance across the connection. In addition, the resistor network comprises a digital resistor network and an analog resistor network. Also, the circuit includes control circuitry for configuring the configurable resistance based on a reference resistance of the reference resistor. The configurable resistance is configured by coarsely tuning the resistor network through the digital resistor network and fine tuning the resistor network through the analog resistor network.

Growing community of inventors

Pleasanton, CA, United States of America

David Edward Fisch