Asml Holding N.v.

Asml Netherlands B.v.

The Perkin-elmer Corporation

Svg Lithography Systems, Inc.

Other

Silicon Valley Group, Inc.

Asml Hoding N.v.

Sug Lithography Systems, Inc.

Buckley, Jere D.

Karatzas, Charles

Galburt, Daniel N.

Sewell, Harry

Zernike, Frits

Daniel Nicholas Galburt

Earl William Ebert

Johannes Onvlee

Stephen Roux

Christopher Charles Ward

Daniel Nathan Burbank

Jos De Klerk

Samir A Nayfeh

Frank Johannes Jacobus Van Boxtel

Mark Josef Schuster

Justin Matthew Verdirame

Abdullah Alikhan

Boguslaw F Gajdeczko

Peter A Delmastro

Frederick Michael Carter

Peter Conrad Kochersperger

Joseph Harry Lyons

Andrew W McCullough

Pradeep Kumar Govil

Willy M Sander

Kevin J Violette

David Taub

Todd Bednarek

Jere D Buckley

Michael F Meehan

Kenneth M Bogursky

Thomas Venturino

David Callan

Erik Roelof Loopstra

Joost Jeroen Ottens

Harry Sewell

Santiago E Del Puerto

Herman Vogel

Laurentius Johannes Adrianus Van Bokhoven

Marcel Hendrikus Maria Beems

David M Williamson

Geoffrey Alan Schultz

David Trost

Mark Edd Williams

Engelbertus Antonius Fransiscus Van De Pasch

Santiago E Delpuerto

Stanley G Janik

Geoffrey O'Connor

Hendricus J M Meijer

Waiming Tam

Charles Karatzas

Frits Zernike

An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

Reticle cooling by non-uniform gas flow

A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

Patterning device support, lithographic apparatus, and method of controlling patterning device temperature

A patterning device support () for controlling a temperature of a patterning device () can include a movable component (). The movable component can include a gas inlet () for supplying a gas flow across a surface of the patterning device and a gas outlet () for extracting the gas flow. The patterning device support can also include a gas flow generator () coupled to a duct () for recirculating the gas flow from the gas outlet to the gas inlet.

A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Reticle cooling system in a lithographic apparatus

A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.

Fluid gauge proximity sensor and method of operating same using a modulated fluid flow

Provided are a methods and systems for determining a topography of an object. In an embodiment, a system includes a reference probe configured to measure a surface of a reference surface and to generate a reference signal, a measuring probe configured to measure a surface of an object and to generate a measurement signal, a sensor configured to sense a position of the measuring probe and to generate a sensor signal, and a combiner configured to receive the sensor signal and the measurement signal and to generate a combination signal therefrom. A desired distance between the measuring probe and the object is substantially maintained by adjusting the position of the measuring probe based on the measurement signal. A topography of the object is determined based at least on a comparison of the reference signal and the combination signal.

Method and system for operating an air gauge at programmable or constant standoff

Provided are a method and system for measuring a distance to an object. The system includes an air gauge configured to sense a distance to a surface of the object and a sensor configured to measure at least one from the group including (i) a relative position of the air gauge and (ii) a relative position of the surface of the object. Outputs of the air gauge and the sensor are combined to produce a combined air gauge reading.

A trajectory planning process receives data generated by high-level control software. This data defines positions and scan velocities. The trajectory planning process creates sequences of constant acceleration intervals that allow critical motions to be executed at maximum throughput. The trajectory planning process outputs a profile. A profile executor, using the profile output by the trajectory planner process, generates continuous synchronized, filtered, multi-axis position and acceleration commands that drive control servos. Time intervals generated by the trajectory planner are quantized to be integer multiples of a real time clock period. The trajectory planner outputs have infinite jerk, but are smoothed by filters in the profile executor to both limit jerk and minimize servo-tracking errors. The trajectory planner allows time for the profile executor filters, but does not restrict fine tuning of the shape of these filters, provided that the width of the tuned filter does not exceed the allowed time.

Method and system for improved trajectory planning and execution

A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Levitated reticle-masking blade stage

A system and method include an object supported on a moveable support, an optical system that transmits radiation onto the object, a support having an aperture therethrough, a sensor system coupled to the support, and a control system coupled to the sensor system and the moveable support. The sensor system is arranged with respect to the aperture to measure a surface of the object and send measurement signals to the control system, such that the control system generates control signals received and used by the moveable support to ensure that the surface of the object receiving light transmitted by the optical system through the aperture is in a focus plane of the optical system.

Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors

Drive for reticle-masking blade stage

A system and method are used to feed a flexible substrate through a patterned beam to be exposed at target portions by the pattered beam. In one example, the flexible substrate is passed over a chuck (e.g., a vacuum chuck). In one example, the chuck can bias the flexible substrate against a chuck surface during alignment, focus, and exposure operations. By biasing the flexible substrate, the flexible substrate can continuously move while being held against the chuck. In one example, the flexible substrate is fed onto the vacuum chuck from a supply roller and fed off the chuck and wrapped on to a take-up roller. The supply and take-up rollers are rotated to follow the scanning motion, which minimizes or substantially eliminates tension on the flexible substrate during the exposure period.

System and method for patterning a flexible substrate in a lithography tool

A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.

Patterned mask holding device and method using two holding systems

An actuator coil with a race track winding that generates a magnetic field. A cooling tube has cooling liquid flowing therethrough and is wrapped around a periphery of the race track winding. A plurality of thermal conductive strips are arranged generally transverse to at least portions of the race track winding so as to conduct heat from the racetrack winding to the cooling tube.

Actuator coil cooling system

Growing community of inventors

Wilton, CT, United States of America

Daniel Nicholas Galburt