Carl Zeiss Multisem Gmbh

Daniel Boecker

Dirk Zeidler

A method includes: providing position data for a plurality of areas on the sample which are to be inspected; providing a first raster arrangement of the plurality of individual particle beams, with a single field of view on the sample assigned to each individual particle beam; defining the position of a nominal scanning area in each single field of view in relation to the first raster arrangement, with the dimensions of the nominal scanning area smaller than the complete single field of view; determining an individual position deviation between a nominal scanning area and the area to be inspected for the at least one individual particle beam; changing the first raster arrangement based on the determined individual position deviation to produce a second raster arrangement of the plurality of individual particle beams; and area-wise scanning the sample using the plurality of individual particle beams in the second raster arrangement.

Method for area-wise inspecting a sample via a multi-beam particle microscope, computer program product and multi-beam particle microscope for semiconductor sample inspection, and its use

Growing community of inventors

Aalen, Germany

Daniel Boecker