Carl Zeiss Smt Gmbh

2e Mechatronic Gmbh & Co. Kg

Daniel Benz

Florian Bach

Armin Werber

Severin Waldis

Yim-Bun Patrick Kwan

Sascha Bleidistel

Berndt Warm

Dirk Heinrich Ehm

Wilfried Noell

Dieter Kraus

Stefan Wiesner

Yim-Bun-Patrick Kwan

Heinz Kück

Volker Mayer

Adrian Schwenk

Karl-Peter Fritz

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Microlithographic projection exposure apparatus

An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

Mirror for guiding a radiation bundle

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Winnenden, Germany

Daniel Benz