Cymer, Inc.

Clay C Titus

John Martin Algots

Raymond F Cybulski

William N Partlo

Igor Vladimirovich Fomenkov

Richard L Sandstrom

Richard M Ness

Richard C Ujazdowski

Scott T Smith

Thomas D Steiger

Paul C Melcher

Stuart L Anderson

William G Hulburd

Gamaralalage G Padmabandu

Curtis L Rettig

Robert A Shannon

Ronald L Spangler

Alex P Ivaschenko

Shahryar Rokni

Paolo Zambon

Robert B Saethre

Mark Branham

David M Johns

Christian J Wittak

Jerome A Emilo

Sunjay Phatak

Michael S Lysik

The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Four KHz gas discharge laser system

Line narrowing unit with flexural grating mount

Growing community of inventors

San Diego, CA, United States of America

Clay C Titus