Average Co-Inventor Count = 4.11
ph-index = 16
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. International Business Machines Corporation (115 from 163,478 patents)
2. Globalfoundries Inc. (14 from 5,671 patents)
3. Adeia Semiconductor Bonding Technologies Inc. (2 from 1,843 patents)
4. Other (1 from 831,952 patents)
5. Kabushiki Kaisha Toshiba (1 from 52,537 patents)
133 patents:
1. 11101357 - Asymmetric high-k dielectric for reducing gate induced drain leakage
2. 10734492 - Asymmetric high-k dielectric for reducing gate induced drain leakage
3. 10600680 - Chemoepitaxy etch trim using a self aligned hard mask for metal line to via
4. 10580894 - Strained semiconductor nanowire
5. 10381452 - Asymmetric high-k dielectric for reducing gate induced drain leakage
6. 10374048 - Asymmetric high-k dielectric for reducing gate induced drain leakage
7. 10367072 - Asymmetric high-k dielectric for reducing gate induced drain leakage
8. 10256139 - Chemoepitaxy etch trim using a self aligned hard mask for metal line to via
9. 10083880 - Hybrid ETSOI structure to minimize noise coupling from TSV
10. 10056487 - Strained semiconductor nanowire
11. 10014214 - Electronic device including moat power metallization in trench
12. 9991167 - Method and IC structure for increasing pitch between gates
13. 9922831 - Asymmetric high-k dielectric for reducing gate induced drain leakage
14. 9899525 - Increased contact area for finFETs
15. 9859122 - Asymmetric high-k dielectric for reducing gate induced drain leakage