Cypress Semiconductor Corporation

Spansion LLC.

Infineon Technologies LLC

Pacific Quest International, LLC

Chun Chen

Shenqing Fang

Kuo Tung Chang

Unsoon Kim

Mark T Ramsbey

James Minsu Pak

Sameer S Haddad

Inkuk Kang

Kuo-Tung Chang

Yoram Betser

Shivananda Shetty

Scott Allan Bell

Sung-Taeg Kang

Angela Tai Hui

Pawan Kishore Singh

Gang Xue

Tio Wei Neo

Giovanni Mazzeo

Lei Xue

Amichai Givant

Yu Nan Sun

Kashmir S Sahota

Alexander H Nickel

Wenmei Li

Wai Lo

Hyesook Hong

Calvin T Gabriel

Rinji Sugino

Tim Thurgate

David H Matsumoto

Tung-Sheng Chen

Shenging Fang

James Pak

A semiconductor device and method of fabricating the same are disclosed. The method includes depositing a polysilicon gate layer over a gate dielectric formed over a surface of a substrate in a peripheral region, forming a dielectric layer over the polysilicon gate layer and depositing a height-enhancing (HE) film over the dielectric layer. The HE film, the dielectric layer, the polysilicon gate layer and the gate dielectric are then patterned for a high-voltage Field Effect Transistor (HVFET) gate to be formed in the peripheral region. A high energy implant is performed to form at least one lightly doped region in a source or drain region in the substrate adjacent to the HVFET gate. The HE film is then removed, and a low voltage (LV) logic FET formed on the substrate in the peripheral region. In one embodiment, the LV logic FET is a high-k metal-gate logic FET.

Method of forming high-voltage transistor with thin gate poly

A semiconductor device and method of making such device is presented herein. The method includes disposing a gate layer over a dielectric layer on a substrate and further disposing a cap layer over the gate layer. A first transistor gate is defined having an initial thickness substantially equal to a combined thickness of the cap layer and the gate layer. A first doped region is formed in the substrate adjacent to the first transistor gate. The cap layer is subsequently removed and a second transistor gate is defined having a thickness substantially equal to the thickness of the gate layer. Afterwards, a second doped region is formed in the substrate adjacent to the second transistor gate. The first doped region extends deeper in the substrate than the second doped region, and a final thickness of the first transistor gate is substantially equal to the thickness of the second transistor gate.

Split gate charge trapping memory cells having different select gate and memory gate heights

A semiconductor device and method of making the same are disclosed. The semiconductor device includes a memory gate on a charge storage structure formed on a substrate, a select gate on a gate dielectric on the substrate proximal to the memory gate, and a dielectric structure between the memory gate and the select gate, and adjacent to sidewalls of the memory gate and the select gate, wherein the memory gate and the select gate are separated by a thickness of the dielectric structure. Generally, the dielectric structure comprises multiple dielectric layers including a first dielectric layer adjacent the sidewall of the memory gate, and a nitride dielectric layer adjacent to the first dielectric layer and between the memory gate and the select gate. Other embodiments are also disclosed.

Memory first process flow and device

Techniques for suppression of program disturb in flash memory devices are described herein. In an example embodiment, a method for suppression of program disturb in a flash memory array is provided. The flash memory array comprises rows and columns of memory cells, where the memory cells in each row are coupled to a source line and to a select-gate (SG) line, and the memory cells in each column are coupled to a respective bit line (BL). During a program memory operation, a first voltage, of a selected SG line, and a second voltage, of an unselected BL, are regulated independently of a power supply voltage of the flash memory array, where the first voltage is regulated in a first range of 0.9V to 1.1V and the second voltage is regulated in a second range of 0.4V to 1.2V.

Suppression of program disturb with bit line and select gate voltage regulation

A split gate device that includes a memory gate and a select gate disposed side by side, a dielectric structure having a first portion disposed between the memory gate and a substrate and a second portion disposed along an inner sidewall of the select gate to separate the select gate from the memory gate, and a spacer formed over the select gate along an inner sidewall of the memory gate. Other embodiments of embedded split gate devices including high voltage and low voltage transistors are also disclosed.

Charge trapping split gate device and method of fabricating same

Systems and methods of forming such include method, forming a memory gate (MG) stack in a first region, forming a sacrificial polysilicon gate on a high-k dielectric in a second region, wherein the first and second regions are disposed in a single substrate. Then a select gate (SG) may be formed adjacent to the MG stack in the first region of the semiconductor substrate. The sacrificial polysilicon gate may be replaced with a metal gate to form a logic field effect transistor (FET) in the second region. The surfaces of the substrate in the first region and the second region are substantially co-planar.

Embedded non-volatile memory device and fabrication method of the same

A semiconductor device that has a split gate charge trapping memory cell having select and memory gates of different heights is presented herein. In an embodiment, the semiconductor device also has a low voltage transistor and a high voltage transistor. In one embodiment, the gates of the transistors are the same height as the select gate. In another embodiment, the gates of the transistors are the same height as the memory gate.

A memory device that has a first gate disposed adjacent to a second gate and a first dielectric structure disposed between the first and second gates. The first dielectric structure has at least four layers of oxide and nitride films arranged in an alternating layer, in which each of the at least four or more layers includes a width in an approximate range of 30 &#x212b; or less. The first dielectric structure further includes a top surface that is substantially un-etched.

Multi-layer inter-gate dielectric structure and method of manufacturing thereof

A semiconductor device having a substrate, a dielectric layer over the substrate, a first gate conductor, an inter-gate dielectric structure and a second gate conductor is disclosed. A gate dielectric structure is disposed between the first gate conductor and the dielectric layer, and may include two or more dielectric films disposed in an alternating manner. The inter-gate dielectric structure may be disposed between the first gate conductor and the second gate conductor, and may include two or more dielectric films disposed in an alternating manner. The second gate conductor is formed in an L shape such that the second gate has a relatively low aspect ratio, which allows for a reduction in spacing between adjacent gates, while maintaining the required electrical isolation between the gates and contacts that may subsequently be formed.

Split-gate semiconductor device with L-shaped gate

A semiconductor device and method of making the same are disclosed. The semiconductor device includes a metal-gate logic transistor formed in a first region of a substrate, and a non-volatile memory (NVM) cell including a select gate and a memory gate formed in a first recess in a second region of the same substrate, wherein the recess is recessed relative to a first surface of the substrate. The metal-gate logic transistor includes a planarized surface above and substantially parallel to the first surface, and top surfaces of the select gate and memory gate are approximately at or below an elevation of the planarized surface of the metal-gate. Generally, at least one of the top surfaces of the select gate or the memory gate includes a silicide formed thereon. Other embodiments are also disclosed.

Split-gate flash cell formed on recessed substrate

A memory device includes a memory array arranged in rows and columns. The memory array may have at least four non-volatile memory (NVM) cells coupled in the same column of the memory array, in which each NVM cell may include a memory gate. The first and second NVM cells of the at least four NVM cells may share a first source region, and the third and fourth NVM cells may share a second source region. The memory gates of the first and second NVM cells may not be electrically coupled with one another, and the first and second source regions may not be electrically coupled with one another. Each of the first and second source regions may be electrically coupled with at least another source region of the same column in the memory array.

Non-volatile memory array with memory gate line and source line scrambling

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San Jose, CA, United States of America

Chun Chen