Rudolph Technologies, Inc.

Onto Innovation Inc.

Christopher J Voges

Tuan D Le

Ajay Pai

Antony Ravi Philip

Jeffrey Peter Treptau

Andrew E Rotering

Dennis L Ohren

John Schaefer

Nicholas Smith

One example of an inspection system includes a laser, a magnification changer, and a first camera. The laser projects a line onto a wafer to be inspected. The magnification changer includes a plurality of selectable lenses of different magnification. The first camera images the line projected onto the wafer and outputs three-dimensional line data indicating the height of features of the wafer. Each lens of the magnification changer provides the same nominal focal plane position of the first camera with respect to the wafer.

Wafer inspection system including a laser triangulation sensor

A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.

On-axis focus sensor and method

Wafer edge inspection approaches are disclosed wherein an imaging device captures at least one image of an edge of a wafer. The at least one image can be analyzed in order to identify an edge bead removal line. An illumination system having a diffuser can further be used in capturing images.

Wafer edge inspection illumination system

Wafer edge inspection

Growing community of inventors

Eden Prairie, MN, United States of America

Christopher J Voges