Siltectra Gmbh

Infineon Technologies Ag

Other

Joint Solar Silicon Gmbh & Co. Kg

Jssi Gmbh

Christian Beyer

Jan Richter

Marko Swoboda

Ralf Rieske

Wolfram Drescher

Franz Schilling

Albrecht Ullrich

Hans-Joachim Schulze

Francisco Javier Santos Rodriguez

Anas Ajaj

Raymund Sonnenschein

Armin Müller

Torsten Sill

Ute Singliar

Christoph Guenther

Gerald Ziegenbalg

Rico Berthold

Carsten Pätzold

Marco Swoboda

Marko David Swoboda

Christoph GÜNTHER

A method of splitting off a semiconductor wafer from a semiconductor bottle includes: forming a separation region within the semiconductor boule, the separation region having at least one altered physical property which increases thermo-mechanical stress within the separation region relative to the remainder of the semiconductor boule; and applying an external force to the semiconductor boule such that at least one crack propagates along the separation region and a wafer splits from the semiconductor boule.

Method for splitting semiconductor wafers

A solid body is disclosed. The solid body includes: a detachment plane in an interior space of the solid body, the detachment plane including laser radiation-induced modifications; and a region including layers and/or components. A multi-component arrangement is also disclosed. The multi-component arrangement includes: a solid-body layer including more than 50% SiC and modifications or modification components generating pressure tensions in a region of a first surface, the modifications being amorphized components of the solid-body layer, the modifications being spaced closer to the first surface than to a second surface opposite the first surface, the first surface being essentially level; and a metal layer on the first surface of the solid-body layer.

Solid body and multi-component arrangement

The present invention therefore relates to a method for separating at least one solid body layer () from a donor substrate (). According to the invention, the method preferably comprises at least the steps of: providing the donor substrate (), wherein the donor substrate () has crystal lattice planes () which are inclined in relation to a planar main surface (), wherein the main surface () delimits the donor substrate () in the longitudinal direction of the donor substrate () on one side, wherein a crystal lattice plane normal is inclined in relation to a main surface normal in a first direction, providing at least one laser, introducing laser radiation of the laser into the interior of the donor substrate () via the main surface () for changing the material properties of the donor substrate () in the region of at least one laser focus, wherein the laser focus is formed by laser beams of the laser which are emitted by the laser, wherein the change in the material property by changing the point of entry of the laser radiation into the donor substrate () forms a linear shape (), wherein the changes in the material property are generated on at least one generating plane (), wherein the crystal lattice planes () of the donor substrate () are oriented in an inclined manner in relation to the generating plane (), wherein the linear design () is inclined in relation to a sectional line () which is produced at the interface between the generating plane () and the crystal lattice plane (), wherein, owing to the changed material property, the donor substrate () tears in the form of subcritical cracks, separating the solid body layer () by introducing an external force into the donor substrate () for connecting the subcritical crack or so much material on the generating plane () being changed by means of the laser radiation that the solid body layer () becomes detached from the donor substrate () with connection of the subcritical crack.

Method for producing wafers with modification lines of defined orientation

The present invention relates to a method, according to claim, for separating at least one solid body layer (), particularly a solid body disk, from a donor substrate (). The method according to the invention comprises preferably at least the following steps: providing a donor substrate (); producing or arranging a stress-producing layer () on a particularly flat surface () of the donor substrate () which axially defines the donor substrate (); pressing at least one pressure application element () of a pressure application device () onto at least one pre-determined portion of the stress-producing layer (), in order to press the stress-producing layer () onto the surface (); separating the solid body layer () from the donor substrate () by thermally applying the stress-producing layer (), thereby producing mechanical stress in the donor substrate (), the mechanical stress creating a crack for separating a solid body layer (), and the pressure application element () being pressed onto the stress-producing layer () during the thermal application of the stress-producing layer ().

Device and method for applying pressure to stress-producing layers for improved guidance of a separation crack

A method for separating a solid-body layer from a donor substrate includes providing a donor substrate having a planar surface, a longitudinal axis orthogonal to the planar surface, and a peripheral surface, and producing modifications within the donor substrate using at least one LASER beam. The at least one LASER beam penetrates the donor substrate via the peripheral surface at an angle not equal to 90° relative to the longitudinal axis of the donor substrate. The method further includes producing a stress-inducing polymer layer on the planar surface of the donor substrate, and producing mechanical stresses in the donor substrate by a thermal treatment of the stress-inducing polymer layer. The mechanical stresses produce a crack for separating the solid-body layer, and wherein the crack propagates along the modifications.

Method for forming a crack in an edge region of a donor substrate

A method for separating wafers from donor substrates incudes: determining at least one individual property of a respective donor substrate, the at least one individual property including doping and/or crystal lattice dislocations of the respective donor substrate; generating donor substrate process data for the respective donor substrate, the donor substrate process data including analysis data of the analysis device, the analysis data describing the at least one individual property of the respective donor substrate; generating, via a laser device, modifications inside the respective donor substrate to form a separating region inside the respective donor substrate, the laser device being operable as a function of the donor substrate process data of the respective donor substrate; and generating mechanical stresses inside the respective donor substrate to initiate and/or guide a crack for separating at least one wafer from the respective donor substrate.

Method for separating wafers from donor substrates

A method for separating a solid body includes: providing a first solid body having opposite first and second surfaces and a crystal lattice, and that is at least partially transparent to a laser beam emitted by a laser; modifying a portion of the crystal lattice by the laser beam, the laser beam penetrating through the first surface, the modified portion of the crystal lattice extending in a plane parallel to the first surface, as a result of the modification, subcritical cracks are formed arranged in a plane parallel to the first surface, a plurality of the subcritical cracks forming a detachment region in the first solid body, the plurality of the subcritical cracks passing at least in some sections through the modified portion of the crystal lattice; and separating the first solid body along the detachment region to form a wafer and a second solid body.

Method for separating a solid body

The invention relates to a method for separating at least one solid-state layer () from at least one solid (). The method according to the invention includes the steps of: producing a plurality of modifications () by means of laser beams in the interior of the solid () in order to form a separation plane (); producing a composite structure by arranging or producing layers and/or components () on or above an initially exposed surface () of the solid (), the exposed surface () being part of the solid-state layer () to be separated; introducing an external force into the solid () in order to create stresses in the solid (), the external force being so great that the stresses cause a crack to propagate along the separation plane (), wherein the modifications for forming the separation plane () are produced before the composite structure is produced.

Method for reducing the thickness of solid-state layers provided with components

The invention relates to a method for creating a detachment zone in a solid in order to detach a solid portion, especially a solid layer, from the solid, said solid portion that is to be detached being thinner than the solid from which the solid portion has been removed. According to the invention, the method comprises at least the steps of: providing a solid which is to be processed and which is preferably made of a chemical compound; providing a LASER light source; subjecting the solid to LASER radiation from the LASER light source so that the laser beams penetrate into the solid via a surface of the solid portion that is to be cut off; the LASER radiation is applied in a defined manner to a predefined portion of the solid inside the solid such that a detachment zone or a plurality of partial detachment zones is formed; the method is characterized in that a number of modifications is successively created in the crystal lattice by the applied laser radiation, and the crystal lattice fissures at least partially in the regions surrounding the modifications as a result of the modification, said fissures in the region of the modifications predefining the detachment zone or a plurality of partial detachment zones.

Splitting of a solid using conversion of material

The invention relates to a production facility () for detaching wafers () from donor substrates (). According to the invention, the production facility comprises at least one analysis device () for determining at least one individual property, particularly the doping, of the respective donor substrate (), a data device () for producing donor substrate process data for individual donor substrates (), wherein the donor substrate process data comprise analysis data of the analysis device (), and the analysis data describe at least the individual property of the donor substrate (), a laser device () for producing modifications () inside the donor substrate () in order to form a region of detachment () inside the respective donor substrate (), wherein the laser device () can be operated according to the donor substrate process data of a concrete donor substrate () for the machining of the concrete donor substrate (), and a detachment device () for producing mechanical voltages inside the respective donor substrate () for triggering and/or guiding a crack for separating respectively at least one wafer () from a donor substrate ().

Production facility for separating wafers from donor substrates

A method for producing a layer of solid material includes: providing a solid body having opposing first and second surfaces, the second surface being part of the layer of solid material; generating defects by means of multiphoton excitation caused by at least one laser beam penetrating into the solid body via the second surface and acting in an inner structure of the solid body to generate a detachment plane, the detachment plane including regions with different concentrations of defects; providing a polymer layer on the solid body; and generating mechanical stress in the solid body such that a crack propagates in the solid body along the detachment plane and the layer of solid material separates from the solid body along the crack.

Method for producing a layer of solid material

A method for producing a detachment area in a solid body in described. The solid body has a crystal lattice and is at least partially transparent to laser beams emitted by a laser. The method includes: modifying the crystal lattice of the solid by a laser beam, wherein the laser beam penetrates through a main surface of a detachable solid portion of the solid body, wherein a plurality of modifications are produced in the crystal lattice, wherein the modification are formed in a plane parallel to the main surface and at a distance from one another, wherein as a result of the modifications, the crystal lattice cracks the regions surrounding the modifications sub-critically in at least the one portion, and wherein the subcritical cracks are arranged in a plane parallel to the main surface.

Method for producing a detachment area in a solid body

A method for creating a detachment zone in a solid includes: providing a solid which is to be processed; providing a laser light source; subjecting the solid to laser radiation from the laser light source so that laser beams penetrate into the solid via a surface of the solid portion that is to be cut off; applying the laser radiation in a defined manner to a predefined portion of the solid inside the solid such that a detachment zone or a plurality of partial detachment zones is formed; wherein a number of modifications are successively created in the crystal lattice by the applied laser radiation, and the crystal lattice fissures at least partially in the regions surrounding the modifications as a result of the modifications, the fissures in the region of the modifications predefining the detachment zone or the plurality of partial detachment zones.

A method includes: providing a semiconductor body having a generation plane and crystal lattice planes which intersect the generation plane at intersecting lines; generating modifications in the semiconductor body by multiphoton excitation and which are spaced apart from one another, the modifications altering a physical property of the semiconductor body so as to form subcritical cracks in the generation plane; and separating a solid-state layer from the semiconductor body by connecting the subcritical cracks in the generation plane.

Method for modifying substrates based on crystal lattice dislocation density

A method of splitting a semiconductor wafer includes: forming one or more epitaxial layers on the semiconductor wafer; forming a plurality of device structures in the one or more epitaxial layers; forming a metallization layer and/or a passivation layer over the plurality of device structures; attaching a carrier to the semiconductor wafer with the one or more epitaxial layers, the carrier protecting the plurality of device structures and mechanically stabilizing the semiconductor wafer; forming a separation region within the semiconductor wafer, the separation region having at least one altered physical property which increases thermo-mechanical stress within the separation region relative to the remainder of the semiconductor wafer; and applying an external force to the semiconductor wafer such that at least one crack propagates along the separation region and the semiconductor wafer splits into two separate pieces, one of the pieces retaining the plurality of device structures.

Growing community of inventors

Freiberg, Germany

Christian Beyer