Industrial Technology Research Institute

Ching-Chiu Liao

Chun-Jung Chen

Po-Fu Chou

A residue removal device includes an object, a sink, and a conveying device. The object includes a contact surface. Residue exists on the contact surface. A solution is contained in the sink. The sink is disposed below the contact surface. The solution corresponds to the contact surface. The conveying device drives the relative motion between the object and the sink. When the residues on the contact surface are contacted by the solution and relative motion is generated between the residues of the contact surface and the solution, the residues are removed by the solution.

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Taoyuan County, Taiwan

Ching-Chiu Liao