Taiwan Semiconductor Manufacturing Comp. Ltd.

Chih-Wing Chang

Yung-Chih Chang

Cheng-Ming Wu

Paul Chu

Chiou-Sung Chiu

A mask storage device for storing a mask used in lithography comprises a desiccant retainer for receiving a desiccant, the desiccant retainer comprising one or more passages. The mask storage device also comprises a first shell and a second shell, the second shell removably attached to the first shell and arranged to form a sealed space with the first shell in a closed state. The desiccant retainer is positioned in the sealed space. The mask storage device also comprises a gasket positioned between the first shell and the second shell. The gasket is configured to create a sufficiently airtight seal between the first shell and the second shell in the closed state. The one or more passages of the desiccant retainer comprise one or more membranes.

Mask storage device for mask haze prevention

A mask storage device and a method of preventing defect formation on a mask are provided. The method includes providing a mask storage device comprising a first and second shell configured to form a sealed space in a closed state and a desiccant positioned within the mask storage device. The method further includes placing a mask inside the mask storage device and sealing the mask storage device with the mask and desiccant inside the sealed space.

Mask storage device for mask haze prevention and methods thereof

A photomask is provided that includes a transparent substrate, a mask pattern formed on a first area of the substrate, the mask pattern having one or more openings that allow light radiation to pass through and having one or more features formed of a first material, and an inspection structure formed on a second area of the substrate different from the first area, the inspection structure being formed of a second material different from the first material.

Method and apparatus for gating photomask contamination

A mask with hydrophobic surface. The mask includes a substrate, a plurality of patterns formed on the substrate, and a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns. The self-assembled monolayer includes an alkyltrichlorosilane-based layer such as octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) and formed by vapor process or solution process.

Mask with hydrophobic surface

A reticle for holding a mask thereon with reduced particle contamination problem is described. The reticle is constructed by a base plate that is formed of an optically transparent material such as quartz and has a recessed slot in a top surface to enclose an area at least the size of a mask formed on the base plate. An adhesive partially fills the recessed slot such that a top surface of the adhesive is at least 0.5 mm below the top surface of the base plate. A pellicle frame is mounted in the recessed slot with a bottom end of the frame encased in the adhesive and a thin film covering the top end of the pellicle frame to from a hermetically sealed cavity for protecting the mask.

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Tainan, Taiwan

Chih-Wing Chang