Taiwan Semiconductor Manufacturing Comp. Ltd.

Realtek Semiconductor Inc.

Epistar Corporation

Au Optronics Corporation

Powertech Technology Inc.

Chih-Wei Wu

Ying-Ching Shih

Szu-Wei Lu

Jing-Cheng Lin

Chen-Hua Douglas Yu

Pu Wang

Hsien-Ju Tsou

Szu Wei Lu

Kung-Chen Yeh

Jiun-Ting Chen

Shin-Puu Jeng

Sung-Hui Huang

Kuan-Yu Huang

Li-Chung Kuo

Chung Yu Wang

Long Hua Lee

Cheng-Chieh Li

Shang-Yun Hou

Chen Ou

Chien-Hao Chen

Chi-Hsi Wu

Chun-Wei Chang

Shih-Tse Chen

Chia-Chen Tsai

Shu-Hang Liao

Sheng-Chih Wang

Chuan-Cheng Chang

Hsin-Mei Tsai

Der-Chyang Yeh

An-Jhih Su

Kuo-Chung Yee

Ying-Ho Chen

Yu-Hung Lin

Tsung-Fu Tsai

Ming-Shih Yeh

Ying-Tsung Chen

Ting-Yu Yeh

Chen-Hsuan Tsai

Chao-Hsun Yang

Chia-Nan Yuan

Yu-Jen Shen

Shu-Wei Hsu

Pai Yuan Li

Hao-Yun Cheng

Wen-Chih Chiou

Hung-Hsin Hsu

Kuo-Chiang Ting

Jung-Hua Chang

Weiming Chris Chen

Liang Sheng Chi

Chun Wei Chang

Ying-Ji Chen

Kun-Lang Wu

Teng-Liang Yu

Wen-Chieh Huang

Wei-Hsiang Shen

A neural network system and a signal processing method are provided. The neural network system includes at least one processing unit and a neural network module. The signal processing method includes: inputting a neural network input to the neural network module by the processing unit to generate an input at a previous layer of each convolutional transformer layer; performing pointwise convolution on the input by a key embedding layer based on key convolutional kernels to output a key tensor; performing convolution on the input by a value embedding layer based on value convolutional kernels to output a value tensor; performing a convolution on the cascading tensor of a first tensor and the key tensor by an attention embedding layer based on attention convolution kernels to output an attention tensor; and outputting an output tensor based on the attention tensor and the value tensor by an output module.

Neural network system and signal processing method

A training system, a training method, and a recognition system are provided. The training method is used to train a neural network module including: an encoder module, a shared decoder module, a synthesis module, and a classification module. The training method includes performing in a training epoch: repeatedly executing: taking a training image from a training set as an input image, obtaining a first loss based on training feature images of the training image and the feature images corresponding to the training image, and obtaining a second loss based on a classification marker of the training image and a classification generated by the classification module in correspondence with the training image; and updating first parameters and second parameters based on an average value of all the first losses and an average value of all the second losses obtained in the preceding step and an update algorithm.

Training system, training method and recognition system

A method of forming a semiconductor package includes: forming a first package component including a first and a second conductive bumps; forming a second package component including a third and a fourth conductive bumps, where dimensions of the first and second conductive bumps are less than dimensions of the third and fourth conductive bumps; and forming a first and a second joint structures to bond the second package component to the first package component. A first angle between an exposed sidewall of the first conductive bump and a tangent line at an end point of a boundary of the first joint structure on the sidewall of the first conductive bump is less than a second angle between an exposed sidewall of the second conductive bump and a tangent line at an end point of a boundary of the second joint structure on the sidewall of the second conductive bump.

Joint structure in semiconductor package and manufacturing method thereof

A package structure including a semiconductor die, a redistribution circuit structure, a backside dielectric layer, conductive terminals, an electronic device, and an underfill is provided. The semiconductor die laterally encapsulated by an insulating encapsulation. The redistribution circuit structure is disposed on the semiconductor die and the insulating encapsulation. The redistribution circuit structure includes redistribution conductive layers and thermal enhancement structures electrically insulated from the redistribution conductive layers, and the thermal enhancement structures are thermally coupled to the semiconductor die. The backside dielectric layer is disposed on the redistribution circuit structure. The conductive terminals penetrate through the backside dielectric layer. The electronic device is disposed over the backside dielectric layer and electrically connected to the redistribution circuit structure through the conductive terminals. The underfill is disposed between the backside dielectric layer and the electronic device, wherein the underfill is thermally coupled to the thermal enhancement structures.

Package structure

A semiconductor package and a manufacturing method thereof are provided. The semiconductor package includes at least one semiconductor die, an interposer, an encapsulant, a protection layer and connectors. The interposer has a first surface, a second surface opposite to the first surface and sidewalls connecting the first and second surfaces. The semiconductor die is disposed on the first surface of interposer and electrically connected with the interposer. The encapsulant is disposed over the interposer and laterally encapsulating the at least one semiconductor die. The connectors are disposed on the second surface of the interposer and electrically connected with the at least one semiconductor die through the interposer. The protection layer is disposed on the second surface of the interposer and surrounding the connectors. The sidewalls of the interposer include slanted sidewalls connected to the second surface, and the protection layer is in contact with the slant sidewalls of the interposer.

Semiconductor package and manufacturing method thereof

In an embodiment, a method includes: forming a fin extending from a substrate; forming a first gate mask over the fin, the first gate mask having a first width; forming a second gate mask over the fin, the second gate mask having a second width, the second width being greater than the first width; depositing a first filling layer over the first gate mask and the second gate mask; depositing a second filling layer over the first filling layer; planarizing the second filling layer with a chemical mechanical polish (CMP) process, the CMP process being performed until the first filling layer is exposed; and planarizing the first filling layer and remaining portions of the second filling layer with an etch-back process, the etch-back process etching materials of the first filling layer, the second filling layer, the first gate mask, and the second gate mask at the same rate.

Methods of forming semiconductor devices

A semiconductor package includes semiconductor bridge, first and second multilayered structures, first encapsulant, and a pair of semiconductor dies. Semiconductor dies of the pair include semiconductor substrate and conductive pads disposed at front surface of semiconductor substrate. Semiconductor bridge electrically interconnects the pair of semiconductor dies. First multilayered structure is disposed on rear surface of one semiconductor die. Second multilayered structure is disposed on rear surface of the other semiconductor die. First encapsulant laterally wraps first multilayered structure, second multilayered structure and the pair of semiconductor dies. Each one of first multilayered structure and second multilayered structure includes a top metal layer, a bottom metal layer, and an intermetallic layer. Each one of first multilayered structure and second multilayered structure has surface coplanar with surface of first encapsulant. The top metal layers, the bottom metal layers, and the intermetallic layers are in contact with the first encapsulant.

A package structure including a first semiconductor die, a second semiconductor die, a molding compound, a bridge structure, through insulator vias, an insulating encapsulant, conductive bumps, a redistribution layer and seed layers is provided. The molding compound encapsulates the first and second semiconductor die. The bridge structure is disposed on the molding compound and electrically connects the first semiconductor die with the second semiconductor die. The insulating encapsulant encapsulates the bridge structure and the through insulator vias. The conductive bumps are electrically connecting the first and second semiconductor dies to the bridge structure and the through insulator vias. The redistribution layer is disposed on the insulating encapsulant and over the bridge structure. The seed layers are respectively disposed in between the through insulator vias and the redistribution layer.

Package structure having bridge structure for connection between semiconductor dies

A method of forming a semiconductor device includes attaching a metal foil to a carrier, the metal foil being pre-made prior to attaching the metal foil; forming a conductive pillar on a first side of the metal foil distal the carrier; attaching a semiconductor die to the first side of the metal foil; forming a molding material around the semiconductor die and the conductive pillar; and forming a redistribution structure over the molding material.

Method of forming integrated fan-out packages with built-in heat sink

A shift control method in manufacture of semiconductor device includes at least the following step. A plurality of semiconductor dies is encapsulated with an insulating encapsulation over a carrier, where at least portions of the plurality of semiconductor dies are shifted after encapsulating. A lithographic pattern is formed at least on the plurality of semiconductor die, where forming the lithographic pattern includes compensating for a shift in a position of the portions of the plurality of semiconductor dies.

Shift control method in manufacture of semiconductor device

A method used for object tracking includes: using a specific object model to generate a first vector of a first ratio object and a second vector of a second ratio object of an image in an object detection bounding box of a specific frame; generating an identity label of an object within the bounding box according to the first vector, the second vector, and M first ratio reference vectors and M second ratio reference vectors stored in an object vector database.

Electronic apparatus and method used for object tracking

A method of performing person re-identification includes: obtaining a person feature vector according to an extracted image containing a person; obtaining state information of the person according to a state of the person in the extracted image; comparing the person feature vector with a plurality of registered person feature vectors in a database; when the person feature vector successfully matches a first registered person feature vector of the plurality of registered person feature vectors, identifying the person as a first identity corresponding to the first registered person feature vector; and selectively utilizing the person feature vector to update one of the first registered person feature vector and at least one second registered person feature vector that correspond to the first identity according to the state information.

Method and apparatus for person re-identification

A semiconductor package includes first and second package components stacked upon and electrically connected to each other, and first and second joint structures. The first package component includes first and second conductive bumps, the second package component includes third and fourth conductive bumps having dimensions greater than those of the first and second conductive bumps. The first joint structure partially covers the first and third conductive bumps. The second joint structure partially covers the second and the fourth conductive bumps. A first angle between a sidewall of the first conductive bump and a tangent line at an end point of a boundary of the first joint structure on the first conductive bump is greater than a second angle between a sidewall of the second conductive bump and a tangent line at an end point of a boundary of the second joint structure on the second conductive bump.

A chip package structure is provided. The chip package structure includes a substrate. The chip package structure also includes a first chip structure and a second chip structure over the substrate. The chip package structure further includes an anti-warpage bar between the first chip structure and the second chip structure. In addition, the chip package structure includes an underfill layer between the first chip structure and the second chip structure and between the anti-warpage bar and the substrate. A topmost surface of the underfill layer is lower than a top surface of the anti-warpage bar.

Chip package structure

A package structure and method of forming the same are provided. The package structure includes a first die and a second die disposed side by side, a first encapsulant laterally encapsulating the first and second dies, a bridge die disposed over and connected to the first and second dies, and a second encapsulant. The bridge die includes a semiconductor substrate, a conductive via and an encapsulant layer. The semiconductor substrate has a through substrate via embedded therein. The conductive via is disposed over a back side of the semiconductor substrate and electrically connected to the through substrate via. The encapsulant layer is disposed over the back side of the semiconductor substrate and laterally encapsulates the conductive via. The second encapsulant is disposed over the first encapsulant and laterally encapsulates the bridge die.

Package structure with bridge die laterally wrapped by insulating encapsulant and surrounded by through vias and method of forming the package structure

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Zhuangwei, Taiwan

Chih-Wei Wu