Panalytical B.v.

Malvern Panalytical B.v.

Charalampos Zarkadas

Waltherus W Van Den Hoogenhof

Petronella Emerentiana Hegeman

Milen Gateshki

Alexander Kharchenko

Gustaaf Christian Brons

Youhong Xiao

Bruno A R Vrebos

Ian Torquels Campbell

Dick Kuiper

Aleksandr Komelkov

Waltherus Van Den Hoogenhof

Alexander Karchenko

A method of analysis of X-ray spectra in an instrument fits a measured sample spectrum using a combination of at least one measured reference spectrum with at least one calculated function. The method includes measuring a reference spectrum as a plurality of measured values for a plurality of energy bins from at least one reference sample; selecting a region or multiple regions of interest corresponding to a plurality of the energy bins and, for each region of interest, recording the profile for the respective plurality of energy bins from the measured reference spectrum. The method further comprises measuring a sample spectrum as a plurality of intensity values for a plurality of energy bins; and fitting the measured sample spectrum to a fit function, the fit funtion including the at least one profile in at least one respective region of interest of the measured spectrum as well as the at least one calculated function.

Analysis of X-ray spectra using fitting

A method of X-ray analysis measures X-ray diffraction in transmission. In order to carry out quantitative measurements, a background measurement is taken slightly away from the diffraction peak and the ratio of measured intensities used to correct for variations in sample composition.

Quantitative X-ray analysis&#x2014;ratio correction

Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle &#x3c8;to the surface of the sample and measuring a measured intensity I(&#x3b8;) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle &#x3c8;corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.

Quantitative X-ray analysis&#x2014;matrix thickness correction

Apparatus includes an X-ray source, a wavelength dispersive X-ray detector for measuring X-ray fluorescence (XRF) and an energy dispersive X-ray detectoragain for measuring X-ray fluorescence. Selected elements are measured using the wavelength dispersive process to reduce the overall measurement time compared with using only one of the two detectors or compared to a simple approach of measuring low atomic number elements with the wavelength dispersive detector and high atomic number elements with the energy dispersive detector. The selection can take place dynamically, in particular on the basis of the results of the energy-dispersive detector.

Quantitative X-ray analysis&#x2014;multi optical path instrument

A two or three part sample holder for X-ray apparatus has a sample ringand a counter ring. The sample ringhas two opposed surfaces and foilsone on each surface holding a powder samplewithin the central hole. The sample ringis relatively thin, of thickness 0.2 to 4 mm. A counter ringis provided to engage with the sample ringto provide increased strength and/or stiffness.

Sample holder

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Almelo, Netherlands

Charalampos Zarkadas