Qualcomm Incorporated

Channappa Desai

Sunil Sharma

Yandong Gao

Anne Srikanth

Pradeep Jayadev Kodlipet

Rahul Sahu

Shiba Narayan Mohanty

Sonia Ghosh

Kalyan Kumar Oruganti

Rahul Biradar

Diwakar Singh

Sreeram Gurram

Venkata Balakrishna Reddy Thumu

An SRAM array circuit in which a horizontal N-well of a well tap cell in a first row separated from a horizontal N-well of a well tap cell in a second row by a P-type substrate region is disclosed. The well tap cells include a bilateral P-type well tap disposed in the P-type substrate region between the horizontal N-wells in the first and second rows providing ground voltage to the P-type substrate on both sides of a column of well tap cells in the SRAM array circuit, rather than one P-type well tap for each side. Well tap cells without a vertical N-well reduces width, which corresponds to a reduction in width of the SRAM array circuit. The bilateral P-type well tap in a P-type implant region may include a plurality of folded fingers providing the ground voltage to the P-type substrate.

Static random-access memory (SRAM) array circuits including bilateral well tap cells with reduced width folded finger structure

An IC includes a first memory block, a second memory block, and a first memory border cell between the first memory block and the second memory block. The first memory border cell includes a first memory core endcap to the first memory block on a first side of the cell. The first memory border cell further includes a second memory core endcap to the second memory block on a second side of the cell. The second side is opposite the first side. The first memory border cell further includes a memory gap portion between the first memory core endcap and the second memory core endcap. The memory gap portion provides a gap between the first memory core endcap and the second memory core endcap.

Memory

SRAM cell circuits have a minimum distance between a storage circuit active region and a read port circuit active region to reduce area. SRAM cell circuits are formed in FinFETs in a storage circuit active area and a read port active area each including one or more diffusion regions of a substrate. Design rule constraints limit a minimum center-to-center distance between adjacent parallel fins. The SRAM bit cell has a reduced total area because a distance between the storage circuit active area and the read port active area is reduced to a minimum separation distance of between 1.0 and 2.15 times the smallest center-to-center distance between adjacent fins. Minimizing a separation distance may include relocating a gate contact of a write access transistor from a location between the storage circuit active region and the read port active region to a location overlapping the storage circuit active area.

Static random access memory (SRAM) bit cell circuits with a minimum distance between a storage circuit active region and a read port circuit active region to reduce area and SRAM bit cell array circuits

A memory is provided with a plurality of cores that power up according to a power-up order from a first core to a final core. As the core power supply voltage for a current core powers up according to the power-up order, it triggers the power-up of a succeeding core in the power-up order responsive to the core power supply voltage exceeding the threshold voltage of a control transistor in the succeeding core.

Memory core power-up with reduced peak current

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Haveri, India

Channappa Desai