Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Byeong-In Choe

Changhyun Lee

Jungdal Choi

Sung-Il Chang

Woonkyung Lee

Changseok Kang

Chang-Hyun Lee

Sunil Shim

Jaehoon Jang

Jung-Dal Choi

Kihyun Kim

Chang-seok Kang

Chan Yong Park

Hansoo Kim

Han-Soo Kim

Jae-Hoon Jang

Jong-Sun Sel

Mincheol Park

Sun-Il Shim

Ju-Hyung Kim

Tea-Kwang Yu

Jin-Soo Lim

Dongseog Eun

Chang-Seok Kang

Jin-Taek Park

Sung-Hwan Jang

Eunsuk Cho

Jin-Man Han

Juhyung Kim

Jin-soo Lim

A method of manufacturing a semiconductor device includes forming a laminated structure including sacrificial layers and a select gate layer on a substrate, forming a penetration region penetrating the laminated structure, forming a select gate insulating layer on a sidewall of the select gate layer exposed by the penetration region, and forming an active pattern in the penetration region. The method also includes exposing a portion of the active pattern by removing the sacrificial layers and forming an information storage layer on the exposed portion of the active pattern.

Semiconductor memory device

A nonvolatile memory device has improved reliability by compensating a threshold voltage of a flash memory cell. A nonvolatile memory device includes a memory cell array and a voltage generator for supplying a select read voltage to a select word line and an unselect read voltage to unselected word lines when a read operation is performed, and supplying a verify voltage to a select word line and the unselect read voltage to unselected word lines when a program operation is performed. The voltage generator supplies a first unselect read voltage to at least one between an upper word line and a lower word line adjacent to the select word line when the program operation is performed, and supplies a second unselected read voltage to at least one between the upper word line and the lower word line adjacent to the select word line when the read operation is performed.

Nonvolatile memory device and read method thereof

An erase method of a nonvolatile memory device includes applying an erase voltage to a substrate; sensing a temperature of a memory cell array; setting a delay time based on the temperature of the memory cell array, wherein the delay time starts in response to the erase voltage being applied to the substrate; applying a ground voltage to a ground selection line connected to a ground selection transistor during the delay time; and increasing a voltage of the ground selection line after the delay time.

Nonvolatile memory device and an erasing method thereof

A nonvolatile memory device includes a substrate and a plurality of cell strings provided on the substrate, each cell string including a plurality of memory cells stacked in a direction perpendicular to the substrate. The methods may include applying a word line erase voltage to word lines connected to memory cells of the cell strings; floating ground selection lines connected to ground selection transistors of the cell strings and string selection lines connected to string selection transistors of the plurality of cell strings; applying a ground voltage to at least one lower dummy word line connected to at least one lower dummy memory cell between memory cells and a ground selection transistor in each of the plurality of cell strings; applying an erase voltage to the substrate; and floating the at least one lower dummy word line after applying of the erase voltage.

Operating methods of nonvolatile memory devices including a ground select transistor and first and second dummy memory cells

Methods of operating a nonvolatile memory device may include applying a word line erase voltage to word lines connected to memory cells of the plurality of cell strings, floating ground selection lines connected to ground selection transistors of the plurality of cell strings and string selection lines connected to string selection transistors of the plurality of cell strings, applying a ground voltage to at least one lower dummy word line connected to at least one lower dummy memory cell between memory cells and a ground selection transistor in each of the plurality of cell strings, applying an erase voltage to the substrate, and floating the at least one lower dummy word line after applying of the erase voltage.

Erasing methods of three-dimensional nonvolatile memory devices with cell strings and dummy word lines

A nonvolatile memory device includes a substrate, a structure including a stack of alternately disposed layers of conductive and insulation materials disposed on the substrate, a plurality of pillars extending through the structure in a direction perpendicular to the substrate and into contact with the substrate, and information storage films interposed between the layers of conductive material and the pillars. In one embodiment, upper portions of the pillars located at the same level as an upper layer of the conductive material have structures that are different from lower portions of the pillars. In another embodiment, or in addition, upper string selection transistors constituted by portions of the pillars at the level of an upper layer of the conductive material are programmed differently from lower string selection transistors.

Nonvolatile memory device and method of making the same

A vertical structure nonvolatile memory device can include a channel layer that extends in a vertical direction on a substrate. A memory cell string includes a plurality of transistors that are disposed on the substrate in the vertical direction along a vertical sidewall of the channel layer. At least one of the plurality of transistors includes at least one recess in a gate of the transistor into which at least one protrusion, which includes the channel layer, extends.

Methods of manufacturing vertical structure nonvolatile memory devices

A nonvolatile memory device including a dummy memory cell and a method of programming the same, wherein the nonvolatile memory device includes a dummy memory cell, and a plurality of memory cells serially connected to the dummy memory cell. The nonvolatile memory device sets a voltage provided to the dummy memory cell according to a distance between a selected memory cell among the plurality of memory cells and the dummy memory cell when a program operation is performed.

Nonvolatile memory device including dummy memory cell and program method thereof

A vertical memory device includes a channel, a ground selection line (GSL), word lines and a string selection line (SSL). The channel extends in a first direction substantially perpendicular to a top surface of a substrate, and a thickness of the channel is different according to height. The GSL, the word lines and the SSL are sequentially formed on a sidewall of the channel in the first direction and spaced apart from each other.

Vertical memory devices and methods of manufacturing the same

According to example embodiments, a nonvolatile memory device includes a substrate, at least one string extending vertically from the substrate, and a bit line current controlling circuit connected to the at least one string via at least one bit line. The at least one string may include a channel containing polycrystalline silicon. The bit line current controlling circuit may be configured to increase the amount of current being supplied to the bit line according to a decrease in a temperature such that a current flowing through the channel of the at least one string is increased when a temperature decreases.

Nonvolatile memory device and operating method thereof

Integrated circuit flash memory devices, such as NAND flash memory devices, include an array of regular flash memory cells, an array of dummy flash memory cells and an erase controller. The erase controller is configured to concurrently apply a different predetermined bias voltage to the dummy flash memory cells than to the regular flash memory cells during an erase operation of the integrated circuit flash memory device. Related methods are also described.

Flash memory device and operating method for concurrently applying different bias voltages to dummy memory cells and regular memory cells during erasure

A nonvolatile memory device preventing a program disturb, a program method thereof and a memory system including the nonvolatile memory device and the program method. The nonvolatile memory device includes a memory cell array; first and second word lines connected to a NAND string in the memory cell array; a third word line connected to the NAND string, the third word line being disposed between the first and second word lines; a temperature sensor configured to measure the temperature of the nonvolatile memory device; and a voltage generator configured to generate first and second pass voltages and a program voltage, and the voltage level of at least one of the first and second pass voltages is controlled according to the measured temperature. When a program operation is performed, the program voltage is applied to the third word line, the first pass voltage is applied to the first word line, the second pass voltage is applied to the second word line.

Nonvolatile memory device, programming method thereof and memory system including the same

An erase method of a charge trap flash memory device, the method including receiving a temperature detection result, and performing an erase operation based on the temperature detection result, wherein the erase operation includes an erase execution interval, an erase verify interval and a delay time between the erase execution interval and the erase verify interval, wherein the erase operation changes a level of a word line voltage applied to word lines during the erase execution interval, a length of the delay time, or a level of the word line voltage applied to the word lines during the delay time.

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Yongin-si, South Korea

Byeong-In Choe