Carl Zeiss Smt Gmbh

Bruno Thome

Wolfgang Singer

Markus Deguenther

Michael Layh

Michael Gerhard

Toralf Gruner

Heiko Feldmann

Daniel Kraehmer

Alexandra Pazidis

Vladimir Kamenov

Stephan Six

Karl-Stefan Weissenrieder

Achim Zirkel

Markus Degünther

The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

Microlithographic projection exposure apparatus

A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination.

Microlithographic illumination system

Growing community of inventors

Aalen, Germany

Bruno Thome