Average Co-Inventor Count = 4.71
ph-index = 6
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Micron Technology Incorporated (7 from 37,972 patents)
2. Tokyo Electron Limited (4 from 10,326 patents)
13 patents:
1. 12463044 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
2. 11935756 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
3. 11335563 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
4. 11273469 - Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
5. 10773282 - Controlling dry etch process characteristics using waferless dry clean optical emission spectroscopy
6. 10607844 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
7. 10446453 - Surface modification control for etch metric enhancement
8. 10304668 - Localized process control using a plasma system
9. 10096483 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
10. 9761457 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
11. 9305782 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
12. 8852851 - Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
13. 8129289 - Method to deposit conformal low temperature SiO2