Taiwan Semiconductor Manufacturing Comp. Ltd.

Bor-Ping Jang

Chung-Shi Liu

Chien Ling Hwang

Yeong-Jyh Lin

Hsin-Hung Liao

Hsiao-Chung Liang

Ming-Da Cheng

Kuei-Wei Huang

Wei-Hung Lin

Meng-Tse Chen

Chien-Ling Hwang

Chen-Hua Douglas Yu

Chih-Wei Lin

Hsiu-Jen Lin

Wen-Hsiung Lu

Chun-Cheng Lin

Yu-Peng Tsai

Ying-Jui Huang

Lin-Wei Wang

Yi-Li Hsiao

Mirng-Ji Lii

Sheng-Yu Wu

Chun-Chieh Wang

Hui-Min Huang

Chih-Fan Huang

Wen-Jye Chung

Jen-Chun Liao

Jy-Jie Gau

Chih-Shih Wei

Su-Jen Cheng

A method for thinning a wafer is provided. The method includes placing a wafer on a support assembly, and the support assembly includes a plurality of pin. The method includes securing an etching mask to a backside of the wafer, and the etching mask has an extending portion which covers a peripheral portion of the wafer. The etching mask has a plurality of circular bores extended along a vertical direction, and the etching mask is secured to the support assembly by connecting the circular bores and the pins. The method also includes performing a wet etching process on the backside of the wafer to foil a thinned wafer, wherein the thinned wafer has a peripheral portion with a first thickness and a central portion having a second thickness smaller than the first thickness.

Method and system for thinning wafer thereof

A method includes placing a package structure into a mold chase, with top surfaces of device dies in the package structure contacting a release film in the mold chase. A molding compound is injected into an inner space of the mold chase through an injection port, with the injection port on a side of the mold chase. During the injection of the molding compound, a venting step is performed through a first venting port and a second venting port of the mold chase. The first venting port has a first flow rate, and the second port has a second flow rate different from the first flow rate.

Wafer level transfer molding and apparatus for performing the same

Embodiments of mechanisms for forming a package are provided. The package includes a substrate and a contact pad formed on the substrate. The package also includes a conductive pillar bonded to the contact pad through solder formed between the conductive pillar and the contact pad. The solder is in direct contact with the conductive pillar.

Mechanisms for forming bonding structures

A method of fabricating a semiconductor package structure is provided. The method includes applying a plurality of first adhesive portions onto a carrier; applying a second adhesive portion onto the carrier; disposing a plurality of micro pins respectively in the first adhesive portions, such that each of the micro pins has a first portion embedded in a corresponding one of the first adhesive portions and a second portion protruding from said corresponding one of the first adhesive portions; bonding a die to the second adhesive portion; forming a molding compound surrounding the micro pins and the die; and removing the carrier from the molding compound after forming the molding compound.

Method of fabricating semiconductor package structure

A semiconductor package structure includes a molding compound, a micro pin extending through the molding compound, and a die surrounded by the molding compound. The micro pin has a top surface, a bottom surface, and a sidewall extending from the bottom surface to the top surface of the micro pin. The sidewall of the micro pin has a first portion and a second portion. The first portion of the sidewall is adjacent to the bottom surface of the micro pin and free of the molding compound. The second portion of the sidewall is adjacent to the top surface of the micro pin and in contact with the molding compound.

Semiconductor package structure

A mold includes a top portion, and an edge ring having a ring-shape. The edge ring is underlying and connected to edges of the top portion. The edge ring includes air vents. The edge ring further encircles the inner space under the top portion of the mold. A plurality of injection ports is connected to the inner space of the mold. The plurality of injection ports is substantially aligned to a straight line crossing a center of the top portion of the mold. The plurality of injection ports has different sizes.

Wafer-level underfill and over-molding

A method includes placing a plurality of dummy dies over a carrier, placing a plurality of device dies over the carrier, molding the plurality of dummy dies and the plurality of device dies in a molding compound, forming redistribution line over and electrically coupled to the device dies, and performing a die-saw to separate the device dies and the molding compound into a plurality of packages.

Methods for controlling warpage in packaging

The present disclosure, in some embodiments, relates to a semiconductor structure. The semiconductor structure includes a substrate and a first conductive pad arranged over the substrate. A boundary structure is on an upper surface of the substrate around the first conductive pad. The boundary structure has one or more sidewalls defining an opening with a round shape over the first conductive pad.

Semiconductor device having a boundary structure, a package on package structure, and a method of making

A semiconductor device includes a carrier having a first central axis extending along a first direction and a second central axis extending along a second direction, a plurality of dies disposed on a surface of the carrier, and a plurality of scribing lines separating the plurality of dies from each other. The plurality of scribing lines include a plurality of continuous lines along the first direction and a plurality of discontinuous lines along the second direction, at least one of the plurality of continuous lines overlaps the first central axis, at least one of the plurality of discontinuous lines overlaps the second central axis. The plurality of dies are symmetrically arranged on the carrier about the first central axis and the second central axis.

Semiconductor wafer device and manufacturing method thereof

A method for thinning a wafer is provided. The method includes placing a wafer on a support assembly and securing an etching mask to a backside of the wafer. The etching mask covers a peripheral portion of the wafer. The method further includes performing a wet etching process on the backside of the wafer to form a thinned wafer, and the thinned wafer includes peripheral portions having a first thickness and a central portion having a second thickness smaller than the first thickness. A system for forming the thinned wafer is also provided.

A semiconductor package includes a carrier, at least and adhesive portion, a plurality of micro pins and a die. The carrier has a first surface and second surface opposite to the first surface. The adhesive portion is disposed on the first surface, and the plurality of the micro pins is disposed in the adhesive portions. The die is disposed on the remaining adhesive portion free of the micro pins.

Interconnect structure for semiconductor package and method of fabricating the interconnect structure

The present disclosure relates to a semiconductor device. In some embodiments, the semiconductor device has a first plurality of conductive pads arranged over a first substrate. A conductive solder material is arranged over and is electrically connected to the first plurality of conductive pads. A first boundary structure separates each conductive pad of the first plurality of conductive pads from an adjacent conductive pad of the first plurality of conductive pads. A die is arranged over the first substrate. The die has outermost sidewalls that are laterally separated from first and second ones of the first plurality of conductive pads by the first boundary structure.

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Chu-Bei, Taiwan

Bor-Ping Jang