Carl Zeiss Smt Gmbh

Björn Liebaug

Hubert Holderer

Franz-Josef Stickel

Dietmar Dürr

Klaus Abele

Jürgen Hofmann

A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position.

Beam-forming and illuminating system for a lithography system, lithography system, and method

A lithography machine includes an optical element, an interface coupled to the optical element, and a component which is separate from the interface. The interface is directly connected to the optical element. The optical element includes an engaging section. The component has a counter engaging section configured to engage with the engaging section of the optical element to connect the component form-fittingly and/or force-fittingly to the optical element.

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Ulm, Germany

Björn Liebaug