Yangtze Memory Technologies Co., Ltd.

Bi Feng Li

Zhiliang Xia

Zi Qun Hua

Yaobin Feng

Qingchen Cao

Lu Ming Fan

Zongliang Huo

ZongLiang Huo

A method for forming a semiconductor structure including forming a plurality of mandrel lines on a first dielectric layer and forming one or more groups of discontinuous mandrel line pairs with a first mask. The method further includes disposing a second dielectric layer, and forming dielectric spacers on sidewalls of the mandrel lines and the discontinuous mandrel line pairs. The method further includes removing the mandrel lines and the discontinuous mandrel line pairs to form spacer masks, forming one or more groups of blocked regions using a second mask, and forming openings extended through the first dielectric layer with a conjunction of the spacer masks and the second mask. The method also includes removing the spacer masks and the second mask, disposing an objective material in the openings, and forming objective lines with top surfaces coplanar with the top surfaces of the first dielectric layer.

Method and structure for cutting dense line patterns using self-aligned double patterning

Systems and methods for designing a dummy pattern layout for improving surface flatness of a wafer are provided. An exemplary system includes at least one processor and at least one memory storing instructions. The instructions, when executed by the at least one processor, cause the at least one processor to perform operations. The operations include identifying a feature pattern corresponding to a functional region of the wafer. The operations also include determining a property of the feature pattern based on a script associated with the feature pattern. The operations further include determining a dummy pattern rule based on the property of the feature pattern. Moreover, the operations include generating a dummy pattern corresponding to a vacant region of the wafer by wrap-filling dummy units in an adjacent area surrounding the feature pattern based on the dummy pattern rule.

Systems and methods for designing dummy patterns

Growing community of inventors

Hubei, China

Bi Feng Li