International Business Machines Corporation

Benjamin T Voegeli

Natalie Barbara Feilchenfeld

Steven H Voldman

Jeffrey P Gambino

Michael Joseph Zierak

Joseph Andrew Iadanza

Bradley Alan Orner

James William Adkisson

Xuefeng Liu

Anthony Richard Bonaccio

Kimball M Watson

Sebastian Theodore Ventrone

Igor Arsovski

Howard Smith Landis

Pradeep Thiagarajan

Bradford Lawrence Hunter

Louis DeWolf Lanzerotti

Frank Ray Keyser, Iii

Peter B Gray

Hayden (Clay) Cranford, Jr

A disposable structure displaced from an edge of a gate electrode and a drain region aligned to the disposable structure is formed. Thus, the drain region is self-aligned to the edge of the gate electrode. The disposable structure may be a disposable spacer, or alternately, the disposable structure may be formed simultaneously with, and comprise the same material as, a gate electrode. After formation of the drain regions, the disposable structure is removed. The self-alignment of the drain region to the edge of the gate electrode provides a substantially constant drift distance that is independent of any overlay variation of lithographic processes.

Lateral diffusion field effect transistor with drain region self-aligned to gate electrode

Methods of electrically programming a diffusion resistor by using trapped charge in a trapped charge region adjacent to the resistor to vary the resistance of the resistor, and the resistor, are disclosed. In one embodiment, a method includes forming a diffusion resistor in a substrate; forming a trapped charge region adjacent to the diffusion resistor; and adjusting a resistance of the diffusion resistor by controlling the trapped charge in the trapped charge region.

Methods of forming and programming an electronically programmable resistor

High performance bipolar transistors with raised extrinsic self-aligned base are integrated into a BiCMOS structure containing CMOS devices. By forming pad layers and raising the height of an intrinsic base layer relative to the source and drain of preexisting CMOS devices and by forming an extrinsic base through selective epitaxy, the effect of topographical variations is minimized during a lithographic patterning of the extrinsic base. Also, by not employing any chemical mechanical planarization process during the fabrication of the bipolar structures, complexity of process integration is reduced. Internal spacers or external spacers may be formed to isolate the base from the emitter. The pad layers, the intrinsic base layer, and the extrinsic base layer form a mesa structure with coincident outer sidewall surfaces.

Bipolar transistor with raised extrinsic self-aligned base using selective epitaxial growth for BiCMOS integration

A successive approximation analog-to-digital converter (ADC) includes an adjustable voltage source that applies an adjustable voltage to an input of a comparator of the ADC to cancel an offset of the ADC. The ADC also includes a control that suspends adjustments of the adjustable voltage when the adjustable voltage converges on the offset. The adjustable voltage source is a digital-to-analog converter.

Comparator offset cancellation in a successive approximation analog-to-digital converter

A differential system producing differential signals with offset cancellation utilizing a double differential input pair system is disclosed. It uses two parallel differential transistor pairs which are intentionally skewed. Nominally, the differential pairs are skewed in opposite direction from each, but with equal magnitude, so that the combination of the two differential pairs is nominally balanced. The current through each differential pair is then increased or decreased until any offset is sufficiently cancelled, using a selection means for providing an equi-potential value to first and second differential inputs in a calibration mode of the system and a comparison means for comparing first and second differential outputs in a calibration mode to determine the offset of the system.

Skewed double differential pair circuit for offset cancellation

An electrically programmable resistor is presented. In one embodiment, a resistor includes a doped body within a substrate; a trapped charge region adjacent to the resistor, the resistance of the resistor controlled by an amount of trapped charge in the trapped charge region.

Electrically programmable resistor

An electrical structure and method of forming. The electrical structure includes a semiconductor substrate comprising a deep trench, an oxide liner layer is formed over an exterior surface of the deep trench, and a field effect transistor (FET) formed within the semiconductor substrate. The first FET includes a source structure, a drain structure, and a gate structure. The gate structure includes a gate contact connected to a polysilicon fill structure. The polysilicon fill structure is formed over the oxide liner layer and within the deep trench. The polysilicon fill structure is configured to flow current laterally across the polysilicon fill structure such that the current will flow parallel to a top surface of the semiconductor substrate.

Deep trench semiconductor structure and method

The present invention relates to a device structure located in a semiconductor substrate and containing high performance vertical NPN and PNP transistors. Specifically, the vertical PNP transistor has an emitter region, and the vertical NPN transistor has an intrinsic base region. The emitter region of the vertical PNP transistor and the intrinsic base region of the vertical NPN transistor are located in a single silicon germanium-containing layer, and they both contain single crystal silicon germanium. The present invention also relates to a method for fabricating such a device structure based on collateral modification of conventional fabrication processes for CMOS and bipolar devices, with few or no additional processing steps.

Vertical PNP transistor and method of making same

A dielectric material layer is formed on a bottom surface and sidewalls of a trench in a semiconductor substrate. The silicon oxide layer forms a drift region dielectric on which a field plate is formed. Shallow trench isolation may be formed prior to formation of the drift region dielectric, or may be formed utilizing the same processing steps as the formation of the drift region dielectric. A gate dielectric layer is formed on exposed semiconductor surfaces and a gate conductor layer is formed on the gate dielectric layer and the drift region dielectric. The field plate may be electrically tied to the gate electrode, may be an independent electrode having an external bias, or may be a floating electrode. The field plate biases the drift region to enhance performance and extend allowable operating voltage of a lateral diffusion field effect transistor during operation.

Lateral diffusion field effect transistor with a trench field plate

Modifying a layout of an integrated circuit (IC) based on a function of an interconnect therein and a related circuit and design structure are disclosed. In one embodiment, a method includes identifying a function of an interconnect in the layout from data of the layout embodied in a computer readable medium; and modifying the layout to form another layout that accommodates the function of the interconnect. A design structure embodied in a machine readable medium used in a design process, according to one embodiment, may include a circuit including a high voltage interconnect positioned in a dielectric layer, the high voltage interconnect positioned such that no fill is above or below the high voltage interconnect.

Modifying layout of IC based on function of interconnect and related circuit and design structure

A resistor-based digital to analog converter (DAC) having mux fastpaths, which selectively connect a subset (or an entirety) of voltage divider nodes in a DAC to either a higher level of multiplexor hierarchy, or a DAC output node, effectively bypassing one or more levels of multiplexor devices. In addition, the fastpaths may selectively connect lower levels of multiplexor hierarchy to higher levels of multiplexor hierarchy and/or a DAC output node.

Digital to analog converter having fastpaths

A gate stack comprising a uniform thickness gate dielectric, a gate electrode, and an oxygen-diffusion-resistant gate cap is formed on a semiconductor substrate. Thermal oxidation is performed only on the drain side of the gate electrode, while the source side is protected from thermal oxidation. A thermal oxide on the drain side sidewall of the gate electrode is integrally formed with a graded thickness silicon oxide containing gate dielectric, of which the thickness monotonically increases from the source side to the drain side. The thickness profile may be self-aligned to the drain side edge of the gate electrode, or may have a portion with a self-limiting thickness. The graded thickness profile may be advantageously used to form a lateral diffusion metal oxide semiconductor field effect transistor providing an enhanced performance.

Growing community of inventors

Burlington, VT, United States of America

Benjamin T Voegeli