United Microelectronics Corp.

Ben Chen

Water Lur

Cheng H Huang

Edward Houn

Eddie Chen

Jen-Tsung Lin

Yu-Tsai Lin

A method for probing the error of energy or dosage in the high-energy ion implantation is disclosed herein. The error source that is from either the energy of ion implantation or the dosage of ion implantation non-normal is decided via the thermal signal value and the thickness of the remained oxidation layer after etching step. The error source can be decided by using different decision standards for phosphorous ion implantation or boron ion implantation. The method comprises the steps as follow: a semiconductor silicon wafer is provided as a test wafer, and an oxidation layer is then formed over the test wafer. A high-energy ion implantation, such as phosphorous ion implantation or boron ion implantation is performed. The oxidation layer is etched via an etching process in a fixing etching time. The thickness of the remained oxidation layer after the etching process is probed. A thermal probe is applied to probe the thermal wave signal from the ion-implant-induced damage. Afterward, the thermal wave signal value and the remained oxidation thickness of the high-energy ion implantation are compared with that of a preceding standard group. Then, the different decision standards created from the thermal wave signal value and the remained oxidation thickness for the high-energy phosphorous or boron ion implantation process are submitted. The error source that is from either the energy of ion implantation or the dosage of ion implantation in non-normal state can be decided via the different decision standards.

Method for probing the error of energy and dosage in the high-energy ion

An improved apparatus is provided for adjusting a gas injector of a furnace in connection with oxidation, diffusion and heat treating in semiconductor processing. The apparatus includes a reaction tube for serving as a reaction chamber and heat sink. The gas injector is coupled to the reaction tube on one end and includes openings on the other end for passing source gas. An elongated open tube is secured to the gas injector and has its axis superimposed approximately on the axis of the gas injector.

Apparatus for adjusting a gas injector of furnace

A new method of fabricating an integrated circuit which maintains global planarization throughout the process flow is achieved. Trenched isolation regions are formed within a silicon substrate. Trenched polysilicon gate electrodes are formed within the silicon substrate and within the trenched isolation regions. Source and drain regions are formed within the silicon substrate wherein the top surfaces of the trenched isolation regions, the trenched polysilicon gate electrodes, and source and drain regions form a planarized top surface of the silicon substrate. A pre-metal dielectric layer is deposited over the planarized top surface. Contact openings are formed by etching through the dielectric to the trenched polysilicon gate electrodes and to the source and drain regions. The contact openings are filled with tungsten plugs wherein the top surfaces of the pre-metal dielectric and the tungsten plugs form a planarized top surface of the silicon substrate. A first metal layer is deposited over the planarized top surface. Oxygen ions are implanted into the first metal layer whereby the first metal layer is transformed into an insulator layer except where the layer is covered by photoresist wherein the top surface of the first metal layer forms a planarized top surface of the silicon substrate. The inter-metal dielectric layer and second metal layer are deposited, patterned, and planarized as for the pre-metal dielectric and first metal layers. A passivation layer completes fabrication of the integrated circuit.

VLSI device with global planarization

A method is described for fabricating an integrated circuit in which the gate electrodes and gate dielectric silicon oxide are protected from electrical charge damage during ion implantation. A thin conducting layer is deposited over the pattern of gate electrodes/gate dielectric silicon oxide wherein the conducting layer is grounded to the silicon substrate. The high-dose ion implantation is applied through the conducting layer which layer grounds the electrical charge resulting from the ion implantation, and hence protects the gate electrodes from charge damage. The electron 'flood gun' need not be used.

Charge damage free implantation by introduction of a thin conductive

A method of fabricating an integrated circuit which maintains global planarization throughout the process flow is achieved. Trenched isolation regions are formed within a silicon substrate. Trenched polysilicon gate electrodes are formed within the silicon substrate and within the trenched isolation regions. Source and drain regions are formed within the silicon substrate wherein the top surfaces of the trenched isolation regions, the trenched polysilicon gate electrodes, and source and drain regions form a planarized top surface of the silicon substrate. A pre-metal dielectric layer is deposited over the planarized top surface. Contact openings are formed by etching through the dielectric to the trenched polysilicon gate electrodes and to the source and drain regions. The contact openings are filled with tungsten plugs wherein the top surfaces of the pre-metal dielectric and the tungsten plugs form a planarized top surface of the silicon substrate. A first metal layer is deposited over the planarized top surface. Oxygen ions are implanted into the first metal layer whereby the first metal layer is transformed into an insulator layer except where the layer is covered by photoresist wherein the top surface of the first metal layer forms a planarized top surface of the silicon substrate. The inter-metal dielectric layer and second metal layer are deposited, patterned, and planarized .

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Hsin-chu, Taiwan

Ben Chen