Asml Netherlands B.v.

Bastiaan Onne Fagginer Auer

Bert Verstraeten

Maria Isabel De La Fuente Valentin

Mariya Vyacheslavivna Medvedyeva

Satej Subhash Khedekar

Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.

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Eindhoven, Netherlands

Bastiaan Onne Fagginer Auer