Tokyo Electron Limited

Atsushi Ueda

Jun Yamashita

Kouki Suzuki

Masakazu Ban

Junichi Kitagawa

Shigenori Ozaki

Yutaka Fujino

Cai Zhong Tian

A plasma processing apparatus includes a microwave introduction device which introduces a microwave into a process chamber. The microwave introduction device includes a plurality of microwave transmitting plates which is fitted into a plurality of openings of a ceiling. The microwave transmitting plates are arranged on one virtual plane parallel to a mounting surface of a mounting table, with the microwave transmitting plates fitted into the respective openings. The microwave transmitting plates includes first to third microwave transmitting plates. The first to third microwave transmitting plates are arranged in such a manner that a distance between the center point of the first microwave transmitting window and the center point of the second microwave transmitting window becomes equal or approximately equal to a distance between the center point of the first microwave transmitting window and the center point of the third microwave transmitting window.

Plasma processing apparatus and microwave introduction device

Liner for plasma processing apparatus

Microwave introducing antenna for a plasma processing apparatus

Cover for a heater stage of a plasma processing apparatus

Growing community of inventors

Nirasaki, Japan

Atsushi Ueda