Ebara Corporation

Asagi Matsugu

Kenichi Kobayashi

Makoto Kashiwagi

Manao Hoshina

Akihiro Yazawa

Takashi Mitsuya

Hideharu Aoyama

Ayumu Saito

Tetsuji Togawa

Kenichi Akazawa

Yasuyuki Miyasawa

Takahiro Nanjo

Fong-Jie Du

Manato Furusawa

Tsuyoshi Soma

Keiichi Nojo

Takashi Koba

Yusuke Sasaya

To achieve a cleaning module and a substrate processing apparatus that can improve the cleaning capability for a substrate with a simple structure. A cleaning module includes a first transfer mechanism-, an ultrasonic cleaning tank, a transfer machine, and a second transfer mechanism-. The first transfer mechanism-is for transferring a substrate WF with a surface to be polished facing downward up to a substrate grip or release positionon a downstream side along a transfer passage. The ultrasonic cleaning tankis disposed at a position spaced apart from the transfer passageand is for cleaning a substrate WF with the surface to be polished facing downward. The transfer machineis for transferring the substrate WF between the substrate grip or release positionof the transfer passageand the ultrasonic cleaning tank. The second transfer mechanism-is for transferring the substrate WF transferred to the substrate grip or release positionfrom the ultrasonic cleaning tankby the transfer machineto further downstream along the transfer passage

Transfer apparatus, cleaning module, and substrate processing apparatus

To provide an automated apparatus for conveying a rectangular substrate. According to one embodiment, there is provided a substrate conveying apparatus for conveying the rectangular substrate. The substrate conveying apparatus includes a plurality of conveyance rollers, a plurality of roller shafts, a motor, and a pusher. The plurality of conveyance rollers are configured to support a lower surface of the substrate. To the plurality of roller shafts, the plurality of conveyance rollers are mounted. The motor is configured to rotate the plurality of roller shafts. The pusher is for lifting the substrate on the plurality of conveyance rollers such that the substrate is separated away from the plurality of conveyance rollers. The pusher includes a stage configured to pass through a clearance between the plurality of roller shafts.

Substrate transporter and substrate processing apparatus including substrate transporter

Accuracy of detection of a fly out of a substrate from a polishing head is improved. A substrate processing apparatus includes a polishing tableto which a polishing padfor polishing the substrate is attachable, a polishing headfor holding and pressing the substrate against the polishing pad, a retainer member disposed surrounding the polishing head, a retainer member pressurization chamber disposed adjacent to the retainer member, an armfor holding and turning the polishing head, and a slip out detectorfor detecting a fly out of the substrate from the polishing headbased on a turning torque of the armor based on a flow rate of a fluid supplied to the retainer member pressurization chamber.

Substrate processing apparatus, substrate processing method, and storage medium that stores program to cause computer in substrate processing apparatus to execute substrate processing method

An accuracy of detecting a slip out of a substrate from a top ring is improved. A polishing unitincludes a polishing table, a top ring, a light emitting member, a slip-out detector, and an elimination mechanism. A polishing padthat polishes a substrate WF is attached to the polishing table. The top ringholds the substrate WF to press the substrate WF against the polishing pad. The light emitting memberemits a light to a detection areaon the polishing pad. The slip-out detectordetects a slip out of the substrate WF from the top ringbased on the light reflected from the detection area. The elimination mechanismeliminates a polishing liquid flowing into the detection area

Polishing unit, substrate processing apparatus, and polishing method

An elastic member that includes a plurality of pressure chambers is manufactured without using a mold having a complicated shape. According to one embodiment, a laminated membrane used in a substrate holder of a substrate processing apparatus is provided. Such a laminated membrane includes a first sheet material and a second sheet material disposed on the first sheet material. A part of the first sheet material is secured to a part of the second sheet material.

Laminated membrane, substrate holder including laminated membrane, and substrate processing apparatus

According to one embodiment, there is provided a top ring for holding a substrate. The top ring comprises a substrate supporting surface, a retainer member disposed to surround an outer periphery of the substrate supporting surface, and a retainer guiding device configured to guide the retainer member so as to allow the retainer member to be displaced in a direction perpendicular to the substrate supporting surface, and support the retainer member so as to inhibit the retainer member from being displaced in a direction parallel to and away from the substrate supporting surface. The retainer guiding device is disposed in an inner side of the retainer member surrounding the substrate supporting surface.

Top ring for holding a substrate and substrate processing apparatus

Provided is a jig for assisting the dismounting and mounting of a top ring. One embodiment provides a jig for mounting/dismounting at least a part of the top ring for holding a substrate. The jig comprises a movable plate for supporting at least a part of the top ring, which is in a dismounted state, a plurality of posts for positioning the jig at a predetermined position relative to the top ring, the plurality of posts being configured to be engaged with the top ring, and a drive mechanism for moving the movable plate in a direction toward and away from the top ring.

Growing community of inventors

Tokyo, Japan

Asagi Matsugu