Carl Zeiss Smt Gmbh

Hottinger Baldwin Messtechnik Gmbh

Arno Schmittner

Holger Kierey

Ralf Scherer

Willi Anderl

Wolfgang Merkel

Eric Eva

Vitaliy Shklover

Markus Bauer

Ralf Winter

Alexey Sergeevich Kuznetsov

Bernhard Weigl

Christof Jalics

Georgo Metalidis

Christoph Nottbohm

Robert Meier

Joram Rosseels

Stefan Lippoldt

Ralf Moser

Florian Herold

Ann-Kathrin Wandner

Marcus Schmelzeisen

Andreas Kolloch

Rob Wilhelmus Maria Janssen

A field facet system for a lithography apparatus comprises: an optical element which comprises an elastically deformable facet portion having a light-reflecting optically active surface; and at least one actuating element for introducing a bending moment into the facet portion to deform the facet portion to change a radius of curvature of the optically active surface. The facet portion is curved in an arched manner in a plan view of the optically active surface. The rigidity of the facet portion as viewed along a longitudinal direction of the facet portion is variable so that a normal vector oriented perpendicularly to the optically active surface tilts exclusively about a spatial direction when the bending moment is introduced into the facet portion.

Field facet system and lithography apparatus

A cost-effective method for repairing reflective optical elements for EUV lithography. These optical elements () have a substrate () and a coating () that reflects at a working wavelength in the range between 5 nm and 20 nm and is damaged as a result of formation of hydrogen bubbles. The method includes: localizing a damaged area () in the coating () and covering the damaged area () with one or more materials having low hydrogen permeability by applying a cover element to the damaged area. The cover element is formed of a surface structure, a convex or concave surface, or a coating corresponding to the coating of the reflective optical element, or a combination thereof. The method is particularly suitable for collector mirrors () for EUV lithography. After the repair, the optical elements have cover elements ().

Method for repairing reflective optical elements for EUV lithography

The disclosure relates to an optical element, in particular for a microlithographic projection exposure apparatus. The optical element has an optical effective surface. The optical element includes a substrate, a layer system that is present on the substrate, and a protective cover extending over an edge region of the optical element that is adjacent to the optical effective surface. During operation of the optical element, the protective coating reduces an ingress of hydrogen radicals into the layer system in comparison with an analogous design without the protective cover, wherein a gap is formed between the protective cover and the layer system.

Optical element, in particular for a microlithographic projection exposure apparatus

The disclosure relates to a cooler for use in a device in a vacuum, wherein the partial pressure of the cooling medium in the vacuum environment during the operation of the cooler is less than 10mbar. The cooler includes a heat sink, wherein a cavity through which the cooling medium flows is formed in the heat sink, and wherein the heat sink includes a connection element which surrounds one end of the cavity through which the cooling medium flows. The cooler also includes a connecting piece for joining a coolant line to the cavity. The connecting piece includes a jacket secured on the connection element by a thermal connecting process. An intermediate layer is between the jacket and the connection element. The jacket exerts a force in the direction of the connection element so that the intermediate layer is under compressive stress in the radial direction during operation of the cooler.

Cooler for use in a device in a vacuum

A load cell has a longitudinal body including a bending beam axially between a force input element and a force output element, strain gages applied on strainable measuring parts of the bending beam, a hermetically sealed enclosure outside around the strain gages and the strainable measuring parts, and an overload protection arrangement including an overload beam in a recess in the bending beam, a receiving hole partially in the overload beam, and a fitting pin received in the receiving hole so that a defined gap is formed between the fitting pin and an adjacent stop surface in the recess of the bending beam. In further embodiments, the enclosure includes a stiff pipe sleeve and ring elements with flexible membranes connecting the sleeve to the longitudinal body, and a mounting end face of the longitudinal body has centering pins in holes and an O-ring in a groove.

Hermetic weighing cell having overload protection

A load cell includes a longitudinal body including force input and output elements and a bending beam, strain gages, and a hermetically sealed enclosure. A force applied onto the input element perpendicularly to the longitudinal axis causes bending strain of the beam, which is measured by the strain gages. The enclosure includes a stiff pipe sleeve and two ring elements, which each include a membrane that is more flexible than the pipe sleeve, and which support the pipe sleeve relative to and spaced radially away from the longitudinal body. The membranes preferably decouple the pipe sleeve from the longitudinal body so that essentially none of the applied force is shunted into the pipe sleeve. Preferably a cylindrical outer surface of the pipe sleeve can avoid accumulation of contaminants.

Bending beam load cell with enclosure

A load cell has a longitudinal body including a bending beam axially between a force input element and a force output element, strain gages applied on strainable measuring parts of the bending beam, a hermetically sealed enclosure outside around the strain gages and the strainable measuring parts, an O-ring and centering pins. An end face of the force input or output element is to be connected to a weighing scale part in an aligned, force-transmitting, hermetically-sealed manner, for which the end face has centering holes receiving the centering pins, a circular groove receiving the O-ring, and a threaded hole receiving a connecting bolt. Further embodiments involve an overload protection integrated in the bending beam, or the enclosure including a stiff pipe sleeve and ring elements with flexible membranes connecting the sleeve to the longitudinal body.

Growing community of inventors

Koenigsbronn, Germany

Arno Schmittner