Novellus Systems Incorporated

Varian Associates, Inc.

Andrew L Nordquist

Kaihan Abidi Ashtiani

Karl B Levy

Kwok Fai Lai

Larry D Hartsough

Maximilian Albert Biberger

Patrick E Ferguson

A magnetron source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity. Step coverage uniformity is also improved by controlling the magnetic fields, and thus the flow of ions and electrons, near the plane of the substrate.

Apparatus and method for controlling plasma uniformity across a substrate

A novel hollow cathode magnetron source is disclosed. The source comprises a hollow cathode with a non-planar target. By using a magnet between the cathode and a substrate, plasma can be controlled to achieve high ionization levels, good step coverage, and good process uniformity.

Physical vapor deposition reactor including magnet to control flow of ions

A hollow cathode magnetron (HCM) sputter source includes a main magnet positioned near the sidewall of the hollow cathode target and a pair of rotating magnet arrays that are positioned near the closed end of the hollow cathode target. One of the arrays produces a magnetic field that is aligned with (aids) the magnetic field produced by the main magnet; the other arrays produce a magnetic field that is aligned against (bucks) the magnetic field produced by the main magnet. Field lines produced by the magnet arrays contain an extension of the plasma that is controlled by the main magnet. Charged particles circulate between the two portions of the plasma. The extended plasma is thus formed over a very high percentage of the surface of the target, thereby creating an erosion profile that is highly uniform and encompasses essentially the entire face of the target. This maximizes the utilization of the target and minimizes the frequency at which the spent target must be replaced.

Apparatus and method for controlling erosion profile in hollow cathode magnetron sputter source

A waveguide window contains a central transverse pane of a material with high dielectric constant such as alumina ceramic. The central pane is an integral number of half-wavelengths thick. On each side of the central pane and immediately adjacent it is a side pane of material with relatively low dielectric constant such as fused quartz. The side panes are odd numbers of quarter-wavelengths thick. The dielectric constants of the side panes are preferably the square root of the dielectric constant of the central pane. The improved wave impedance matching provides a low wave reflection over a wide frequency band.

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Mountain View, CA, United States of America

Andrew L Nordquist