Asml Netherlands B.v.

Andrei Mikhailovich Yakunin

Vadim Yevgenyevich Banine

Erik Roelof Loopstra

Jan Bernard Plechelmus Van Schoot

Johannes Hubertus Josephina Moors

Gerardus Hubertus Petrus Maria Swinkels

Wouter Anthon Soer

Harmen Klaas Van Der Schoot

Lucas Henricus Johannes Stevens

Vladimir Mihailovitch Krivtsun

Maarten Marinus Johannes Wilhelmus Van Herpen

Martin Jacobus Johan Jak

Andrey Alexandrovich Nikipelov

Olav Waldemar Vladimir Frijns

Antonius Theodorus Wilhelmus Kempen

Vladimir Vitalevich Ivanov

Luigi Scaccabarozzi

Sander Frederik Wuister

Wilhelmus Petrus De Boeij

Arie Jeffrey Den Boef

Marcus Adrianus Van De Kerkhof

Michel Riepen

Johan Frederik Dijksman

Yvonne Wendela Kruijt-Stegeman

Martinus Cornelis Maria Verhagen

Richard Joseph Bruls

Roelof Koole

Han-Kwang Nienhuys

Pieter-Jan Van Zwol

Antonius Johannes Josephus Van Dijsseldonk

Mária Péter

Vladimir Vitalevitch Ivanov

Maarten Van Kampen

Leonid Aizikovitch Sjmaenok

Denis Alexandrovich Glushkov

Viacheslav Medvedev

Uwe Bruno Heini Stamm

Edgar Alberto Osorio Oliveros

Hermanus Kreuwel

Jozef Petrus Henricus Benschop

Dzmitry Labetski

Vladimir Mikhailovich Krivtsun

Hendrikus Gijsbertus Schimmel

Hendrikus Robertus Marie Van Greevenbroek

Arjen Boogaard

Willem Joan Van Der Zande

Denny Mathew

Alexander Matthijs Struycken

Carlo Cornelis Maria Luijten

Dennis De Graaf

Ramin Badie

Nicolaas Aldegonda Jan Maria Van Aerle

Marcel Johannus Elisabeth Hubertus Muitjens

Hendrik Antony Johannes Neerhof

Koen Gerhardus Winkels

Arthur Winfried Eduardus Minnaert

Alexey Sergeevich Kuznetsov

Hendrik Jan Kettelarij

Jan Van Schoot

Ivo Vanderhallen

Nikolay Nikolaevitch Salashchenko

Bert Pieter Van Drieënhuizen

Alexander Marinus Arnoldus Huijberts

Florian Didier Albin Dhalluin

Leonid Aizikovitsj Sjmaenok

Jens Arno Steinhoff

Fredericus Christiaan Van Den Heuvel

Pedro Julian Rizo Diago

Ferdinandus Martinus Jozef Henricus Van De Wetering

Paulus Albertus Maria Gasseling

Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk

Vladimir Nikolaevich Polkovnikov

Vadim Iourievich Timoshkov

Adrianus Johannes Maria Van Dijk

Petrus Elizabeth Maria Kuijpers

Alexandre Kodentsov

Tatyana Viktorovna Rakhimova

Dmitriy Viktorovich Lopaev

Roel Moors

Hans Joerg Mallmann

Kurstat Bal

Mária PÉTER

Olav Frijns

Gerardus Swinkels

Antonius Kempen

Lucas Stevens

A reticle conditioning system includes: a support structure to support a reticle; a gas supply module to provide a flow of gas adjacent to the reticle; and a biasing module to control an electrical potential of the reticle. The biasing module includes a first electrode, a second electrode and a voltage supply. The first and second electrodes are each spaced apart from and facing the reticle, when the reticle is supported by the support structure, so as to at least partially overlap with the reticle. The voltage supply is arranged to maintain the first electrode at a positive voltage, and the second electrode at a negative voltage, these voltages being such that the voltage of the reticle is negative. The second electrode is disposed such that, when the reticle is supported by the support structure, it does not overlap an image forming portion of the reticle.

Patterning device conditioning system and method

A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

Graphene spectral purity filter

A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 10cm, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.

Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane

A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.

Lithographic apparatus

A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Lithographic apparatus, spectral purity filter and device manufacturing method

A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.

Lithographic system

Pellicle for reticle and multilayer mirror

A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target () at a plasma formation location () and directing a continuous-wave excitation beam () at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

Method and apparatus for generating radiation

A lithographic apparatus includes an optical element that includes an oriented carbon nanotube sheet. The optical element has an element thickness in the range of about 20-500 nm and has a transmission for EUV radiation having a wavelength in the range of about 1-20 nm of at least about 20% under perpendicular irradiation with the EUV radiation.

Optical element comprising oriented carbon nanotube sheet and lithographic apparatus comprising such optical element

A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

Radiation source

A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000&#xb0; C.

Spectral purity filter

A radiation source having a fuel stream generator () that generates and directs a fuel stream () along a trajectory towards a plasma formation location (). A pre-pulse laser radiation assembly directs a first beam of laser radiation () at the fuel stream at the plasma formation location to generate a modified fuel target (). A main pulse laser radiation assembly directs a second beam of laser radiation () at the modified fuel target at the plasma formation location to generate a radiation generating plasma (). A collector () collects the radiation and directs it along an optical axis () of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Lithographic apparatus and method of manufacturing a device

A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

Radiation source, lithographic apparatus, and device manufacturing method

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Eindhoven, Netherlands

Andrei Mikhailovich Yakunin