Rigaku Corporation

Akito Sasaki

Akihiro Himeda

Keiichi Morikawa

Kazuhiko Omote

Hiroki Yoshida

Yoshiyasu Ito

Yuji Tsuji

Toshiyuki Kato

Kunio Nishi

Keigo Nagao

Norihiro Muroyama

Takao Ohara

Aya Kuribayashi

Yukiko Ikeda

A method for displaying measurement results from X-ray diffraction measurement, in which a sample is irradiated with X-rays and the X-rays diffracted by the sample are detected by an X-ray detector, comprises: (1) forming a one-dimensional diffraction profile by displaying, on the basis of output data from an X-ray detector, a profile in which one orthogonal coordinate axis shows 2&#x3b8; angle values and another orthogonal coordinate axis shows X-ray intensity values; (2) forming a two-dimensional diffraction pattern by linearly displaying X-ray intensity data, for each 2&#x3b8; angle value and on the basis of output data from the X-ray detector; the X-ray intensity data being present in the circumferential direction of a plurality of Debye rings formed at each 2&#x3b8; angle by diffracted X-rays; and (3) displaying the two-dimensional diffraction pattern and the one-dimensional diffraction profile so as to be aligned such that the 2&#x3b8; angle values of both coincide with each other.

Method for displaying measurement results from x-ray diffraction measurement

Peak positions and integrated intensities of diffraction X-ray are determined on the basis of X-ray diffraction measurement data output from an X-ray diffractometer, the number of determined peaks of the diffraction X-ray is counted, and analysis processing is started when the counted number of peaks reaches a preset peak number. The analysis processing is repetitively executed on the basis of X-ray diffraction measurement data. The peak positions and the integrated intensities of the diffraction X-ray are determined from the X-ray diffraction measurement data obtained from the start of the measurement till the analysis processing concerned, and qualitative analysis of collating the determined peak positions and integrated intensities with standard peak card data whose data base is made in advance and searching materials contained in a measurement sample, and quantitative analysis of determining the quantities of the materials contained in the measurement sample are executed.

Analysis method for X-ray diffraction measurement data

An X-ray analysis apparatus has information about a relationship between selection of a measurement type and a replacement work of optical parts and shows, on a screen of a display, graphical information about optical parts which should be changed, to make it easy for an operator to perform a preliminary work before measurement. When the operator selects one desired measurement type among a plurality of measurement types in a selection window, there is displayed on the display, depending on the selected measurement type, graphical information about necessary optical parts which should be newly installed and/or installed optical parts which should be removed. The operator looks at the operating instructions and then performs the replacement work. The graphical information may be: graphical indication of the installation locations of the optical parts; different pictorial expressions about the installation and the removal works; and graphical indication of the identification marks of the optical parts.

X-ray analysis apparatus

Disclosed herein is a sample-analyzing method, in which an incident beam slit is provided between an X-ray source and a sample, a receiving side beam slit is provided between the sample and an X-ray detector, the X-ray detector detects X-rays scattered again from the sample and coming through the receiving side beam slit when the sample is irradiated with the X-rays applied through the incident beam slit, and a value is measured from a value detected by the X-ray detector. In the method, a true value is measured from the value, by using a slit function representing an influence which the incident beam slit and receiving side beam slit impose on the detected value. The slit function is determined from an intensity distribution of the X-rays scattered again from the sample. The method obtains an accurate slit function in accordance with the structure of the optical system employed and can therefore analyze the sample with high precision.

Method of performing analysis using propagation rays and apparatus for performing the same

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Akishima, Japan

Akito Sasaki