Tokyo Electron Limited

Akira Iwami

Merritt Funk

Asao Yamashita

Masayuki Tomoyasu

Akira Obi

Shigeaki Kato

Masaya Odagiri

Hisato Tanaka

Kevin Augustine Pinto

Kazushi Tahara

Lemuel Chen

Hiroyuki Takahashi

A processing system and method for chemical oxide removal (COR) is presented, wherein the processing system comprises a first treatment chamber and a second treatment chamber, wherein the first and second treatment chambers are coupled to one another. The first treatment chamber comprises a chemical treatment chamber that provides a temperature controlled chamber, and an independently temperature controlled substrate holder for supporting a substrate for chemical treatment. The substrate is exposed to a gaseous chemistry, such as HF/NH, under controlled conditions including surface temperature and gas pressure. The second treatment chamber comprises a heat treatment chamber that provides a temperature controlled chamber, thermally insulated from the chemical treatment chamber. The heat treatment chamber provides a substrate holder for controlling the temperature of the substrate to thermally process the chemically treated surfaces on the substrate.

Method and system for performing a chemical oxide removal process

According to the present invention, as processing apparatus drive starts, the operating state of software used to drive the processing apparatus is monitored in real time to diagnose whether or not an abnormality has occurred (S). If it is judged through the diagnosis performed in Sthat no abnormality has occurred, the workpiece processing is allowed to continue uninterrupted and then a decision is made as to whether or not the workpiece processing has been completed (S). If the processing has been completed, the processing apparatus is stopped (S). If, on the other hand, it is judged through the diagnosis performed in Sthat an abnormality has occurred, a log of the diagnosis item with regard to which the abnormality has occurred is recorded (S). The processing apparatus is then stopped (S).

Method of maintaining and automatically inspecting processing apparatus

Method of automatically resetting processing apparatus

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Yamanashi, Japan

Akira Iwami