Ebara Corporation

Tohoku University

Kabushiki Kaisha Toshiba

Akio Shibata

Hirokuni Hiyama

Katsunori Ichiki

Seiji Samukawa

Kazuo Yamauchi

Akira Fukuda

Katsuya Okumura

Haruo Okano

Hiroshi Yokota

Manabu Tsujimura

Makiko Emoto

Kentaro Fujita

A beam source has a plasma generating chamber, an antenna for generating plasma in the plasma generating chamber, a first electrode disposed in the plasma generating chamber, and a second electrode disposed in the plasma generating chamber. Both of the antenna and the second electrode face the first electrode. The beam source also includes a power supply for applying a voltage between the first electrode and the second electrode to extract particles from the plasma generated by the antenna. The beam source applies various kinds of beams having a large diameter, such as a positive ion beam, a negative ion beam, and a neutral particle beam, uniformly to a workpiece.

Beam source and beam processing apparatus

A beam source has a plasma generating chamber and a gas inlet port for introducing a gas into the plasma generating chamber. The beam source includes a plasma generator for generating positive-negative ion plasma containing positive ions at a density of at least 10ions/cmand negative ions from the gas. The beam source also includes a plasma potential adjustment electrode disposed in the plasma generating chamber and a grid electrode having a plurality of beam extraction holes formed therein. The beam extraction holes have a diameter of at least 0.5 mm. The beam source has a first power supply for applying a voltage of at most 500 V between the plasma potential adjustment electrode and the grid electrode.

A solar cell is manufactured by bringing a front side of a semiconductor crystal substrate into contact with an electrolytic liquid containing a fluoride, placing an electrode in the electrolytic liquid, passing a current between the electrode and the semiconductor crystal substrate and applying light to the semiconductor crystal substrate to generate pairs of holes and electrons. Etching of the substrate proceeds by combining the holes with ions in the front side of the semiconductor crystal substrate which is held in contact with the electrolytic liquid, thereby forming at least one surface irregularity structure thereon.

Solar cell and method of manufacturing same

A method and apparatus for discharging hydrogen from a vacuum vessel using a roughing vacuum pump and a turbo-molecular pump. During discharge of hydrogen from the vacuum vessel, a material which has excellent reactivity with hydrogen, such as a material which has been excited or ionized by microwave or laser radiation, is introduced into the exhaust system. The material reacts with hydrogen to convert hydrogen into another substance of large molecular weight, whereby the evacuating performance of the vacuum exhaust system is improved with respect to discharging of hydrogen.

Method for discharging hydrogen from a vacuum vessel using a roughing

Growing community of inventors

Fujisawa, Japan

Akio Shibata