Tokyo Electron Limited

Tokyo Electron Limi Ted

Akihiro Teramoto

Tokutarou Hayashi

Koji Takayanagi

Shinichi Hatakeyama

Yuichiro Kunugimoto

Yuta Nishiyama

Toru Tokimatu

Shota Ueyama

Yuichi Yamamoto

Naruaki Iida

Suguru Enokida

Hiroichi Inada

Koji Tanaka

Yuichi Douki

Yuji Kimura

Hirotoshi Mori

Eiichi Sekimoto

Masashi Tsuchiyama

Satoshi Shimmura

Mitsuteru Yano

Masataka Gosho

Kenji Yada

Yukiyoshi Saito

Wataru Tsukinoki

Kousei Ide

Kazutoshi Ishimaru

Tatsuhiko Tsujihashi

Keita Hirase

Keisuke Sasaki

Norifumi Sato

Hiroki Harada

Kenta Shibasaki

Shinichi Seki

Masahiro Abe

Youichi Masaki

Shinichi Ikeda

Shota Takei

Kazuaki Kitamura

Tooru Tokimatu

Shunsuke Kurizaki

Tsuyoshi Otsuka

Teppei Ito

A motor control method for transferring an object to be transferred by a moving object that moves by driving of a motor in a substrate processing apparatus, includes: a data acquisition process of acquiring, at different times, pieces of drive data which relate to the driving of the motor and vary with heat generation of the motor; and a transfer process of transferring the object to be transferred by controlling current to be supplied to the motor, based on each of the pieces of drive data, to compensate for displacement of the object to be transferred from a target transfer position due to the heat generation of the motor.

Motor control method, transfer device, and storing medium

A substrate processing system includes: a carry-in/out section in which a cassette accommodating a plurality of substrates is carried in/out; a batch processing section in which a wafer lot including the plurality of substrates is collectively processed in a state where each of the plurality of substrates stand upright; a single-wafer processing section in which the plurality of substrates included in the wafer lot are processed one by one in a horizontal state; and an interface section that delivers the plurality of substrates from the batch processing section to the single-wafer processing section. The interface section includes: a standby table that horizontally holds a substrate in a state of being in contact with pure water; and a transfer mechanism that delivers the substrate from the batch processing section to the standby table.

Substrate processing system and substrate processing method

A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.

Liquid amount measuring method and computer-readable recording medium

A solution treatment apparatus applies a coating solution onto a substrate. The apparatus includes a holder holding and rotating the substrate; a coating solution supplier supplying the coating solution to the substrate on the holder; and an inner cup surrounding the holder from a lateral side and having a peripheral edge side upper surface inclining down outward in a radial direction from an apex part located below a peripheral edge side of the substrate on the holder. The inner cup has discharge ports formed along a circumferential direction at the apex part; and the discharge ports are formed to discharge a cleaning solution and make the cleaning solution flow down along the peripheral edge side upper surface of the inner cup, thereby cleaning the peripheral edge side upper surface, and to discharge the cleaning solution outward in the radial direction and obliquely upward.

Solution treatment apparatus and cleaning method

Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig

A substrate processing apparatus configured to process a substrate includes a substrate receptacle placing unit configured to place thereon a substrate receptacle accommodating therein the substrate to be processed; and a storage zone provided adjacent to the substrate receptacle placing unit to store therein the substrate receptacle. The storage zone includes multiple storages which are vertically arranged in multiple levels and configured to place and store thereon the multiple substrate receptacles horizontally. The substrate receptacle is transferred between a first storage of the multiple storages at an uppermost position and a ceiling travelling vehicle configured to be moved above the substrate processing apparatus. A second storage of the multiple storages under the first storage is configured to place and store the substrate receptacle thereon such that a direction of the substrate receptacle on the second storage is different from a direction of the substrate receptacle on the first storage.

Substrate processing apparatus and substrate receptacle storage method

There is provided a substrate processing apparatus for processing a substrate, including: a storage part provided on an uppermost portion of the substrate processing apparatus and on which a substrate accommodation container for accommodating the substrate is placed; and a first transfer device configured to directly or indirectly deliver the substrate accommodation container between the storage part and a loading/unloading part, wherein the loading/unloading part is configured to place the substrate accommodation container thereon in the substrate processing apparatus and to load and unload the substrate into and from a processing part of the substrate processing apparatus, and the first transfer device is configured to deliver the substrate accommodation container with respect to an overhead hoist transport that moves above the substrate processing apparatus.

Substrate processing apparatus and substrate processing method

Holding pad for substrate transfer

A device includes a substrate holding unitconfigured to hold a substrate and be movable in a transversal direction to transfer the substrate from one module to another module; a first detecting unitconfigured to detect a position of the substrate on the substrate holding unitbefore the substrate holding unittransfers the substrate into the another module after receiving the substrate from the one module; second detecting unitsandconfigured to detect a position deviation between a position of the substrate holding unit, which is located at a temporary position set to transfer the substrate into the another module, and the temporary position; and a position determining unitconfigured to determine a transfer position where the substrate is transferred into the another module based on the position of the substrate on the substrate holding unitand the position deviation.

Substrate transfer device, substrate transfer method and recording medium

A technique which, when transporting a substrate from one module to another, detects a displacement of the substrate on a holding member and transfers the substrate to another module with the displacement within an acceptable range. Displacement of a wafer on a fork of a transport arm from a reference position is determined when the fork has received the wafer from one module and, when the displacement is within an acceptable range, the wafer is transported by the transport arm to another module. When the displacement is out of the acceptable range, the wafer is transported by the transport arm to a wafer stage module, and then the transport arm receives the wafer from the wafer stage module so that the displacement comes to fall within the acceptable range. The wafer can therefore be transferred to another module with the displacement within the acceptable range.

A substrate transfer device that transfers a substrate by allowing a substrate opening formed on a front surface of a substrate transfer vessel to face an opening formed on a partition wall from one side of the partition wall and separating a cover body of the substrate transfer vessel from the other side of the partition wall includes a door configured to open and close the opening from the other side of the partition wall; a reciprocating unit configured to straightly move the door back and forth between a first position where the opening is closed and a second position away from the first position toward the other side of the partition wall; and a rotating unit configured to rotate the door around a rotation axis in a straightly moving direction of the door between the second position and a third position deviated from a region facing the opening.

Substrate transfer device, substrate transfer method, and storage medium

There is provided a technique which can prevent poor processing of successive substrates in the event of a failure of a module or a transport mechanism for transporting a substrate between modules. A substrate processing apparatus includes: a plurality of modules from which a substrate holder of a substrate transport mechanism receives a substrate; a sensor section for detecting a displacement of the holding position of a substrate, held by the substrate holder, from a reference position preset in the substrate holder; and a storage section for storing the displacement, detected when the substrate holder receives a substrate from each of the modules, in a chronological manner for each module. A failure of one of the modules or the substrate transport mechanism is estimated based on the chronological data on the displacement for each module, stored in the storage section. This enables an early detection of a failure or abnormality.

Substrate processing apparatus, substrate processing method and non-transitory storage medium

Substrate holder

A substrate treatment apparatus is disclosed. The substrate treatment apparatus includes: a cassette loading portion on which a cassette for containing a substrate is loaded when the cassette is carried to/from outside of the substrate treatment apparatus; a substrate treatment portion for performing a treatment on the substrate; a substrate carrying portion for carrying the substrate in the cassette loaded on the cassette loading portion to the substrate treatment portion, and carrying the substrate that has been subjected to the treatment by the substrate treatment portion to the cassette on the cassette loading portion; a vacant cassette loading portion on which the cassette caused to be vacant by carrying the substrate to the substrate treatment portion is temporarily loaded; and a vacant cassette transfer mechanism for transferring the vacant cassette between the vacant cassette loading portion and the cassette loading portion.

Substrate treatment apparatus

Growing community of inventors

Koshi, Japan

Akihiro Teramoto