Niederzier, Germany

Detlev Grützmacher

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovations of Detlev Grützmacher

Introduction

Detlev Grützmacher is a notable inventor based in Niederzier, Germany. He has made significant contributions to the field of optoelectronics, particularly through his innovative methods for depositing crystal layers at low temperatures. His work has implications for the development of advanced electronic components.

Latest Patents

Grützmacher holds a patent for a method titled "Method for depositing a crystal layer at low temperatures, in particular a photoluminescent IV-IV layer on an IV substrate, and an optoelectronic component having such a layer." This patent describes a technique for monolithically depositing a monocrystalline IV-IV layer that glows when excited. The method involves several steps, including providing hydrides and halides of IV elements, heating substrates, and ensuring the integration of elements in crystalline order. The patent highlights the ability to achieve a dislocation density of less than 6 cm on substrates such as silicon or germanium.

Career Highlights

Grützmacher is affiliated with Forschungszentrum Jülich GmbH, where he has been instrumental in advancing research in his field. His innovative approaches have garnered attention and recognition within the scientific community.

Collaborations

He has collaborated with notable colleagues, including Stephan Wirths and Dan Mihai Buca, contributing to various research projects and enhancing the scope of their work.

Conclusion

Detlev Grützmacher's contributions to the field of optoelectronics through his innovative patent and collaborative efforts underscore his importance as an inventor. His work continues to influence advancements in technology and materials science.

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